Photo mask board cleaning method

Abstract

The invention relates to a method for cleaning the large photo-etching mask plate of TFT-LCD (film transistor-liquid crystal display), wherein it uses high-pressure air gun, polymer cleaning rod and industry cotton rod, acetone and water, to effectively clean the fine particles and stain on the face of plate. The inventive method can be used in cleaning room on-site, to utilize the dust checker in the exposure device, to real-time detect the particle condition on the face of plate, which will cause exposure pattern transfer.

Description

technical field [0001] The invention relates to a method for cleaning a large photolithographic reticle for TFT-LCD (thin film transistor-liquid crystal display) industry. Background technique [0002] In the TFT-LCD manufacturing industry, especially in the manufacturing of large-size liquid crystal panels, photolithography masks are key components in the photolithography process. Using ultraviolet light and a photolithographic mask to expose the pattern coated with photoresist (photosensitive resin) according to the designed pattern, the electronic device pattern on the photolithographic mask can be transferred to the substrate according to 1:1 or other ratios, Electronic devices are formed through processes such as developing, etching, and stripping. Defects in the photolithographic mask will cause defects in the product pattern after exposure and transfer, resulting in low reliability or low yield of the product. There are two types of defects in photolithography masks...

AI Technical Summary

Problems solved by technology

[0003] The photolithography mask is only cleaned regularly or returned to the manufacturer for processing, and the common defects of the product caused by the adhesion of foreign matter on the surface of the mask cannot be discovered in time, which may cause a large number of defective products, or cannot be processed in time, resulting in production failure. stagnation