Metal oxide semiconductor field-effect transistor with isolating structure and its production
一种氧化物半导体、场效晶体管的技术,应用在金属氧化物半导体场效晶体管领域,能够解决制造过程复杂、高制作成本等问题,达到高击穿电压、低导通阻抗的效果
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[0087] see Figure 4 and Figure 5 As shown, it is a schematic top view of the area and a schematic cross-sectional view of the structure of the metal oxide semiconductor field effect transistor of the present invention. As can be seen from the figure, the present invention provides an N-type metal oxide semiconductor field effect transistor 10, which at least includes: a P-type substrate 100, a first N-type embedded layer (buried layer) 101 and a P-type epitaxial layer (epitaxial layer) 90 is placed in the P-type substrate 100, a first N-type diffusion region 21 with N-type conductive ions forms a first N-type well 210 in the first N-type embedded layer 101, a first N-type well 210 with The first P-type diffusion region 22 of P-type conductive ions forms a first P-type region 220 in the first N-type well 210, and a first drain diffusion region 23 with N+ type conductive ions forms in the first N-type well 210. A first drain region 230 is formed in the diffusion region 21, a...
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