Photosensitive resin composition, its condensate and display panel used interval element formed therewith
A technology of photosensitive resin and composition, which is applied in the fields of photosensitive material processing, chemical instruments and methods, optics, etc., and can solve problems such as difficulty in taking into account cured product characteristics and operability, storage stability, and operability reduction, etc., to achieve Maintain storage stability, ease of handling, and excellent compressive strength
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[0090] Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to these examples. In addition, hereinafter, "parts" all represent parts by weight unless otherwise specified.
[0091] Preparation of alkali-soluble photosensitive resin solution:
Embodiment 1~4
[0094] Examples 1-4 and comparative examples
[0095] Preparation of photosensitive resin composition:
[0096] Use the raw materials shown in Table 1, mix each component according to the mixing ratio shown in Table 2, stir at room temperature for 3 hours to dissolve each component, and use a microporous filter with a pore size of 0.45 μm to filter to obtain a photosensitive composition ( 1 liquid composition).
[0097] Element
chemical name or trade name
photosensitive resin
The resin solution that makes in the synthesis example
photopolymerization initiator
2-Benzyl-2-dimethylamino-1-
(4-Morpholinylphenyl)-butan-1-one
dipentaerythritol hexaacrylate
Oxazine compounds *1
① B-a benzoxazine
② F-a benzoxazine
③P-d type benzoxazine
Oxetane compounds *2
OXT-121
Organic solvents
Propylene glycol monomethyl ether acetate
[0098] * 1: Benzoxaz...
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