Method for impulsive bias arc ion plating multi-player super-hard nano films of titanium/titanium nitrate

A technology of arc ion plating and titanium nitride nanotechnology, which is applied in ion implantation plating, coating, sputtering plating, etc., and can solve problems such as difficult manipulation, fast deposition rate, and poor actual service performance.

Inactive Publication Date: 2005-10-12
DALIAN UNIV OF TECH
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AI Technical Summary

Problems solved by technology

In recent years, the machining industry has to develop towards higher speed and continuous production, and tools and molds have to be used in harsher environments. The properties of titanium nitride thin films prepared by simple ordinary methods (film base bonding force 40N- 50N, hardness 24GPa) can not fully meet this requirement
[0003] Making thin-film materials into nano-multilayer structures can improve and enhance its comprehensive performance, which can reflect the strengthening effect of nano-size; although arc ion plating has an irreplaceable role in the synthesis of nitride-based hard films, but Because ordinary arc ion plating always has large particle defects to pollute the surface, high ion energy and mixed interface, and deposition rate is fast and difficult to control, etc., it is generally believed that arc ion plating is not suitable for preparing fine hard metal with nanometer multilayer structure. At present, this type of film is mainly prepared by magnetron sputtering ion plating and other methods, but there are generally disadvantages such as low deposition rate, weak film-substrate bonding force and not very outstanding actual service performance.

Method used

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Embodiment Construction

[0009] The present invention will be further described below in combination with specific embodiments.

[0010] Put the high-speed steel workpiece into the vacuum chamber of the arc ion plating equipment after cleaning and drying, and install pure titanium targets on all cathode arc source positions; vacuumize to 5×10 -3 Pa; pass the argon gas to 0.36Pa, start the titanium arc, set the arc current at 60A, add a DC negative bias to -1000V for sputter cleaning for 5 minutes; adjust the arc current to 80A; change the bias to pulse mode, and the bias amplitude The value is -900V, the frequency is 30KHz, and the duty cycle is 40%. At the same time, the argon gas is turned off and the nitrogen gas is turned on to 0.36Pa, and the titanium nitride layer starts to be deposited. After 30 seconds, the nitrogen gas is stopped, and the argon gas is continued to be turned on, and the pressure is still 0.36. Pa, start to deposit the pure titanium layer, then stop the argon gas for 90 seconds...

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Abstract

A surface modification technology of nanometer multi-layer hard membrane of Ti / titanium oxide by way of pulsed biasing. Apply to pulsed biasing to improve deposit quality of membrane in the arc process. Interchange Ar and N2 interchange and control the time interval. Then cover is fit on the preface of metal.

Description

technical field [0001] The invention belongs to the technical field of metal material surface modification. Background technique [0002] Titanium nitride film coating on the surface of the tool or mold will double the service life. In the 1980s, it caused a wide range of tool technology revolutions, and provided key conditions for the rapid industrialization of the automatic production line in the machining industry. In recent years, the machining industry has to develop towards higher speed and continuous production, and tools and molds have to be used in harsher environments. The properties of titanium nitride thin films prepared by simple ordinary methods (film base bonding force 40N- 50N, hardness 24GPa) can no longer fully meet this requirement. [0003] Making thin-film materials into nano-multilayer structures can improve and enhance its comprehensive performance, which can reflect the strengthening effect of nano-size; although arc ion plating has an irreplaceable ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/14C23C14/34C23C14/54
Inventor 林国强赵彦辉肖微夏元化董闯闻立时
Owner DALIAN UNIV OF TECH
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