Process for preparing low-temperature phase barium metaborate monocrystalline film
A technology of barium metaborate and single crystal thin film, which is applied in the direction of single crystal growth, chemical instruments and methods, crystal growth, etc., can solve the problems of low mechanical strength, group velocity mismatch, deformation, etc., and achieve good economic benefits and save energy. material effect
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Embodiment 1
[0023] In a platinum crucible of φ100×80mm, Li with pores was placed 2 CO 3 and Al 2 O 3 A total of 100 grams of mixed material, including Al 2 O 3 Content 88 grams, Li 2 CO 3 Content 12 grams. The (001) face α-BBO wafer (size: 10×10×0.5 mm) polished on both sides 3 ) on the platinum wire, and the wafer is covered with the same proportion of Li 2 CO 3 and Al 2 O 3 Mix 30 grams of powder and the crucible cover of the thermocouple, the top of the crucible is sealed with a platinum cover, placed in a resistance furnace, heated to 850 °C at 20 °C / hour, kept at a constant temperature for 6 hours, and then lowered to room temperature at a cooling rate of 30 °C / hour .
[0024] figure 2 The X-ray diffraction analysis of the surface of the sample in this example shows that a β-BBO film with a preferred orientation of (001) is formed on the surface of the sample. The X-ray twin crystal rocking experiment of the sample is as follows image 3 , it indicates that the β-BBO ...
Embodiment 2
[0026] In a platinum crucible of φ100×80mm, Li with pores was placed 2 CO 3 and Al 2 O 3 A total of 100 grams of mixed material, including Al 2 O 3 Content 95 grams, Li 2 CO 3 Content 5 grams. The double-sided polished (001) plane α-BBO wafer was placed on a platinum wire, and the wafer was covered with the same proportion of Li 2 CO 3 and Al 2 O 3 Mix 30 grams of powder and the crucible cover of the thermocouple, seal the top of the crucible with a platinum cover, place it in a resistance furnace, raise the temperature at 100°C / hour to 1000°C, maintain a constant temperature for 2 hours, and then cool down to room temperature at a rate of 80°C / hour . The results showed that β-BBO thin films were formed on the surface of α-BBO wafers.
Embodiment 3
[0028] In a platinum crucible of φ100×80mm, Li with pores was placed 2 CO 3 and Al 2 O 3 A total of 100 grams of mixed material, including Al 2 O 3 Content 5 grams, Li 2 CO 3 Content 95 grams. The double-sided polished (001) plane α-BBO wafer was placed on a platinum wire, and the wafer was covered with the same proportion of Li 2 CO 3 and Al 2 O 3 Mix 30 grams of powder and the crucible cover of the thermocouple, the top of the crucible is sealed with a platinum cover, placed in a resistance furnace, heated to 700 °C at 50 °C / hour, kept at a constant temperature for 100 hours, and then lowered to room temperature at a cooling rate of 100 °C / hour , to obtain β-BBO thin films.
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