Semiconductor memory

A memory and semiconductor technology, which is applied in semiconductor devices, static memory, semiconductor/solid-state device manufacturing, etc., can solve the problems of chip size chip cost increase, etc., and achieve the effect of avoiding defects and minimizing layout area

Inactive Publication Date: 2004-03-31
FUJITSU LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is a problem that widening the wiring width of the global bit line may lead to an increase in chip size and chip cost

Method used

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  • Semiconductor memory
  • Semiconductor memory
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Embodiment Construction

[0030] Embodiments of the present invention will be described below with reference to the accompanying drawings. In the drawings, each thick line represents a signal line composed of a plurality of lines. Signals preceded by " / " are negative logic. Double circles in the figure indicate external terminals. In the following description, the signal name may be abbreviated, such as " / CS signal" means "chip select signal".

[0031] figure 1 A first embodiment of the semiconductor memory of the present invention is shown. This semiconductor memory is formed as an SRAM on a silicon substrate by using a CMOS process.

[0032]This SRAM has an instruction buffer 10 , an address buffer 12 , a data input / output buffer 14 , an operation control circuit 16 , address decoders 18 and 20 , and a memory core 22 .

[0033] The command buffer 10 receives command signals (chip select signal / CS, write enable signal / WE, and output enable signal / OE) from the outside. The address buffer 12 re...

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Abstract

A first amplifier amplifies voltage of a first local bit line connected to static memory cells. Precharging circuits for precharging a first global bit line connected to an output of the first amplifier supply a precharging current through both ends of the first global bit line, respectively. Since the precharging current flows through the first global bit line in both directions, electromigration criteria can be made looser than in cases where the current flows in one direction. This makes it possible to avoid a defect which occurs due to electromigration of the first global bit line. Since the first global bit line can be reduced in wiring width, it is possible to minimize the layout area. As a result, the semiconductor memory can be reduced in chip size with a reduction in chip cost.

Description

technical field [0001] The present invention relates to semiconductor memories with static memory cells. In particular, the present invention relates to semiconductor memories having hierarchically structured bit lines. Background technique [0002] As transistor structures become finer and finer, the storage capacity of semiconductor memories is also increasing. At the same time, as the structure of transistors becomes finer, the operating frequency of logic LSIs such as microcomputers continues to increase. In order to increase the operating frequency, the access time of the semiconductor memory is required to be shorter. DRAMs and such semiconductor memories have a hierarchical structure of bit lines in view of reduced access times. In order to meet the need for further acceleration, it has recently been considered to employ hierarchy even in the wiring structure of bit lines in a semiconductor memory having static memory cells (hereinafter referred to as SRAM). [00...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11C11/41G11C7/12G11C7/18G11C11/417G11C11/419G11C11/4193H01L21/8244H01L27/10H01L27/11
CPCG11C7/18G11C11/419G11C7/12G11C11/34
Inventor 清水宏
Owner FUJITSU LTD
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