Zinc gallium oxide ceramic target material and its preparation method and application
A zinc gallium oxide, ceramic target technology, applied in conductors, electrical components, non-insulated conductors, etc., can solve problems such as difficulties and decreased device performance stability, achieve good performance consistency, strong film-based adhesion, The effect of low production cost
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Embodiment 1
[0021] Zinc oxide powder with a purity of 99.9% and gallium oxide powder with a purity of 99.9% (accounting for 2.1% of the total mass) are uniformly mixed with each other, and formed by cold pressing at a pressure of 2.50×10 6 N. Sinter at 1560°C to form a block with a density of 96% of the theoretical density, and make a target with a size of 400mm×200mm×6mm. Using this target material, zinc gallium oxide transparent conductive film was deposited on polyester film by radio frequency sputtering deposition method, the thickness of the obtained film was 30nm, and the resistivity was 6.2×10 -4 Ω.cm, 550nm visible light transmittance is 86%.
Embodiment 2
[0023] Zinc oxide powder with a purity of 99.99% and gallium oxide powder with a purity of 99.99% (accounting for 4.6% of the total mass) are uniformly mixed with each other, and formed by cold pressing at a pressure of 2.50×10 6 N. Sinter at 1180°C to form a block with a density of 95% of the theoretical density, and make a target with a size of 400mm×200mm×6mm. Using this target material, the zinc-gallium oxide transparent conductive film was deposited on the glass by DC magnetron sputtering deposition method. The thickness of the obtained film was 30nm and the resistivity was 3.6×10 -4 Ω.cm, 550nm visible light transmittance is 88%.
Embodiment 3
[0025] Zinc oxide powder with a purity of 99.99% and gallium oxide powder with a purity of 99.99% (accounting for 6.8% of the total mass) are uniformly mixed with each other, and formed by cold pressing at a pressure of 2.50×10 6 N. Sintered at 1680°C to form a block with a density of 97% of the theoretical density, and make a target with a size of 400mm×200mm×6mm (length×width×height). Three targets are bonded to form a production line size target of 1200mm×200mm×6mm. Using this target, the zinc gallium oxide transparent conductive film is deposited on the glass by DC magnetron sputtering deposition method. The thickness of the obtained film is 110nm, the resistivity is 4.43×10 -4 Ω.cm, the visible light transmittance of 550nm is 87%.
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