Diluted magnetic ZnO-base semiconductor prepared by sol-gel method
A technology of magnetic semiconductor and gel method, which is used in semiconductor/solid-state device manufacturing, inorganic material magnetism, inductor/transformer/magnet manufacturing, etc. It can solve the problems of difficult to obtain p-n junction homogeneous contact and difficult to obtain p-type materials.
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[0012] Specific steps are as follows:
[0013] 1. Prepare ZnO colloidal solution. Dissolve a certain amount of analytically pure zinc acetate and ferrous chloride in absolute ethanol, and stir evenly
[0014] Stir, and add an appropriate amount of lactic acid dropwise until the solution is about to precipitate. Stirring was continued for 2 hours. Finally get ZnO glue
[0015] body solution. The atomic concentration ratio of iron and zinc is 1 to 15%; the colloidal ratio of Mn, Co and Ni is the same as that of Fe, also in
[0016] 1~15%. Salts of Mn, Co and Ni can be used, as well as chlorides or sulfates.
[0017] 2. Add a drop of 0.02ml of ZnO colloidal solution on the pre-cleaned Si wafer,
[0018] The rate is uniformly coated on the Si wafer.
[0019] 3. The film is placed at room temperature to 100°C for 10 to 30 minutes, and then heat-treated at 240 to 300°C for 5-10 minutes.
[0020] 4. Repeat steps 2 and 3 above several times to obtain ZnO films with differe...
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