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Method and equipment for preparing electronic grade gas by adopting thermal coupling technology

A heat-coupled, electronic-level technology, applied in the chemical industry, can solve the problems of leakage safety accidents, fluorine gas is highly toxic, highly chemically active, and strong oxidizing, and achieves simple processes, significant economic and energy-saving benefits, and reduced equipment investment Effect

Active Publication Date: 2022-07-08
南京佳华科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Fluorine gas itself is highly toxic, highly chemically active, and highly oxidizing, and leakage is prone to serious safety accidents

Method used

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  • Method and equipment for preparing electronic grade gas by adopting thermal coupling technology
  • Method and equipment for preparing electronic grade gas by adopting thermal coupling technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] like figure 1 As shown, a device for preparing electronic-grade gas using a double-tower pressurized heat pump thermal coupling technology includes a reactive rectification thermal coupling tower 3, a rectification thermal coupling tower 5, and the reactive rectification thermal coupling tower 3 tower bottom is equipped with a first The thermally coupled reboiler 7 is equipped with a second thermally coupled reboiler 11 at the bottom of the rectification thermally coupled tower 5; the raw material inlet of the reactive rectification thermally coupled tower 3 is connected to the raw material conveying pipeline, and the There is a raw material conveying pump 1 on the road, and the discharge port at the bottom of the reactive rectification thermal coupling tower 3 is connected with the circulating inlet on the upper part of the reactive rectification thermal coupling tower 3 through the outer circulating pipeline of the tower, and an oxidant circulating pump 2 is arranged o...

Embodiment 2

[0068] Industrial grade carbon dioxide raw material, the main components are as follows: carbon dioxide 96.9mol%, carbon monoxide 0.403mol%, nitrogen 2.7mol%, SO 2 About 1ppmv, methanol about 2ppmv, water about 0.5ppmv, COS about 0.5ppmv, oxygen 465ppmv, Fe 2+ About 9~10ppmv

[0069] The oxidizing agent adopts 6wt% potassium permanganate solution.

[0070] The theoretical plate number of reactive distillation thermal coupling tower 3 is 45, the raw material inlet is located on the 22nd plate, the side line extraction port is located on the 37th plate, the oxidant feed port (ie the circulation inlet) is located on the 16th plate, and the reflux port is located on the 16th plate. 16 boards.

[0071] The number of theoretical plates of the rectification heat coupling tower is 44, the feed port is located on the 21st board, and the discharge port is located on the last theoretical board.

[0072] Adopt embodiment 1 double tower pressurized heat pump heat coupling process to pre...

Embodiment 3

[0077] Industrial grade arsine raw material, the main components are as follows: hydrogen 2000ppmv, nitrogen 1000ppmv, carbon dioxide 80ppmv, water 1ppmv, the rest are arsine 0.996914mol%, Fe 2+ is 5ppmv.

[0078] The oxidizing agent used 3 wt% potassium dichromate solution.

[0079] The theoretical plate number of the reactive distillation thermal coupling tower 3 is 55, the feed inlet is located on the 14th plate, the side line extraction outlet is located on the 44th plate, and the oxidant feed port is located on the 11th plate.

[0080] The number of theoretical plates of the rectification heat coupling tower 5 is 50, the feed port is located on the 38th plate, and the discharge port is located on the last theoretical plate.

[0081] Adopt embodiment 1 double tower pressurized heat pump heat coupling process to prepare electronic grade arsine, the steps are as follows:

[0082] Industrial grade arsine raw material (in gaseous state, feed temperature 0°C, feed pressure 1....

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Abstract

The invention discloses a method for preparing electronic-grade gas by adopting a thermal coupling technology, which comprises the following steps: conveying a raw material to a reactive distillation thermal coupling tower, inputting an oxidizing agent, carrying out oxidation reaction on metal in the raw material and the oxidizing agent, and refluxing a material at the bottom of the reactive distillation thermal coupling tower into the tower through a circulating pipeline; light components at the top of the reactive distillation thermal coupling tower are compressed, then enter a thermal coupling reboiler at the bottom of the distillation thermal coupling tower for primary heat exchange, are subjected to secondary cooling and then flow back into the tower from the top of the tower, or the light components at the top of the reactive distillation thermal coupling tower are condensed and then flow back into the tower; a heavy component-containing material on the side line of the self-reaction rectification thermal coupling tower enters the rectification thermal coupling tower for refining treatment, a tower top component of the rectification thermal coupling tower is compressed or self-pressurized, then enters a thermal coupling reboiler at the bottom of the reaction rectification thermal coupling tower for primary heat exchange, and then is subjected to secondary cooling to obtain electronic-grade gas. The method has the advantages of low equipment investment and low energy consumption, and can obtain the electronic-grade gas with few impurities and high purity at high yield.

Description

technical field [0001] The invention belongs to the fields of chemical industry and electronic industry, and particularly relates to a method and equipment for preparing electronic grade gas by adopting thermal coupling technology. Background technique [0002] Electronic gas is a gas industry term and a general term for gases used in the semiconductor industry. At present, electronic gases mainly include hydrogen fluoride, ammonia, hydrogen chloride, nitric oxide, carbon monoxide, carbon tetrafluoride, arsine, sulfur hexafluoride, etc. Electron gas is an indispensable raw material for the production of VLSI, flat-panel display devices, compound semiconductor devices, solar cells, optical fibers and other electronic industries. It is widely used in thin film, etching, doping, vapor deposition, diffusion and other processes. Electronic gases can be classified into electronic grades, LSI grades, VLSI grades, and VLSI grades according to purity grades and usage occasions. [...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D3/00
CPCB01D3/009Y02P20/10
Inventor 徐梦谢佳华杨盼张扬
Owner 南京佳华科技股份有限公司
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