Data processing method and system for acquiring plasma parameters

A plasma and data processing technology, applied in the field of data processing methods and systems of plasma parameters, can solve the problem of not considering the impact, not mentioning the selection method of the position and width of the linear fitting interval, and not considering the calculation results of ion collection current The impact of the problem, to achieve the effect of reliable electron density and fast calculation process

Pending Publication Date: 2022-05-13
SHANDONG UNIV
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Problems solved by technology

[0005] In summary, although the basic principle of Langmuir probe diagnosis is not complicated, no one has been able to give a clear and reasonable standard for how to determine the position and width of the fitting interval of the I-V curve transition zone of Langmuir probe
Generally speaking, most people are based on the original data of the I-V curve, and perform linear fitting on the Ln|I|-V curve of the entire transition zone, and the reciprocal of the slope of the linear fit is T e , however, this data processing method neither considers the effect of ion collection current on T e calculation results, and does not take into account the effect of V p Nearby space charge effects on T e The effect of fitting results
On the other hand, it was proposed to select the middle third of the Ln|I|-V curve of the entire transition zone for linear fitting, which avoids the effect of space charge on T e The influence of the fitting results, but still can not avoid the effect of ionic current on T e The effect of fitting results
In addition, F.F.Chen et al. proposed that the ionic current needs to be deducted before the linear fitting of the Ln|I|-V curve, but they did not mention that the Ln|I e How to Select the Position and Width of the Linear Fitting Interval of |-V Curve

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  • Data processing method and system for acquiring plasma parameters
  • Data processing method and system for acquiring plasma parameters
  • Data processing method and system for acquiring plasma parameters

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Embodiment 1

[0044] In one or more embodiments, a data processing method for obtaining plasma parameters such as figure 1 As shown, it specifically includes the following process:

[0045] (1) Read the given raw I-V data and smooth it.

[0046] (2) Select the probe potential where the current is zero as the suspension potential V f , taking the maximum value of the first-order conduction of current to voltage as the space potential V p , with V f and V p As the start and end points of the transition zone, calculate the number of points n in the transition zone, and use 2n / 3 as the number of fitting points;

[0047] (3) Linear fitting of the ion current in the saturation region to the space potential V p , and take this as the ion current I i , further, subtract the ion current from the original current data one by one, and take the natural logarithm of the result to obtain Ln|I e |.

[0048] (4) Set the space potential V p As the end point of fitting the whole region, push forward...

Embodiment 2

[0054] In one or more embodiments, a data processing system of a Langmuir probe I-V curve is disclosed, comprising:

[0055] The data acquisition module is configured to acquire the voltammetric curve of the plasma and smooth it;

[0056] The fitting point determination module is configured to select the probe potential where the current is zero as the plasma suspension potential, use the maximum value of the first-order derivative of the current to voltage as the plasma space potential, and use the suspension potential and the space potential as the transition region Starting and ending points, calculating the number of points in the transition zone, and determining the number of linear fitting points of the electron temperature according to the number of points in the transition zone;

[0057] The ion current determination module is configured to linearly fit the ion current in the saturation region and extrapolate it to the plasma space potential, and use it as the ion curr...

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Abstract

The invention provides a data processing method and system for acquiring plasma parameters, and the method not only can acquire a plurality of plasma parameters such as plasma space potential, suspension potential, electron saturation collection current and the like, but also can automatically set the fitting point number of a linear fitting interval and find an optimal fitting interval. And finally calculating to obtain the accurate electron temperature and electron density of the plasma. According to the invention, not only can the linear fitting interval of the electron current be effectively prevented from being too large or too small, but also the influence of the ion collection current on the plasma electron temperature and electron density calculation result can be effectively avoided.

Description

technical field [0001] The invention belongs to the technical field of plasma diagnosis, and in particular relates to a data processing method and system for obtaining plasma parameters. Background technique [0002] The statements in this section merely provide background information related to the present invention and do not necessarily constitute prior art. [0003] Langmuir probe technique is one of the most commonly used plasma diagnostic methods. By analyzing the I-V characteristic curve of the Langmuir probe, we can obtain many plasma parameters such as plasma electron density, electron temperature, ion density, space potential, and electron energy distribution function. Among them, the electron temperature is a particularly important parameter. Obtaining accurate plasma electron temperature is of great significance to many fields such as national defense technology, new energy development, and space physics. According to the classical Langmuir probe theory, in the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/10G06T11/20H05H1/00
CPCG06F17/10G06T11/203H05H1/0075
Inventor 李建泉李书翰张清和邢赞扬谢新尧
Owner SHANDONG UNIV
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