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Epitaxial growth apparatus

A technology of epitaxial growth and induction coil, which is applied in the direction of metal material coating process, coating, gaseous chemical plating, etc. It can solve the problems of uneven quality of epitaxial layer, the inability to control the speed of multiple trays independently, and unbalanced temperature. , to achieve the effect of ensuring temperature balance, reducing temperature difference, and good quality

Active Publication Date: 2022-03-29
ZHEJIANG QIUSHI SEMICON EQUIP CO LTD +1
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0004]Most of the current epitaxy furnaces only have one working space, and multiple trays are set in the working space to increase the output. However, multiple trays share one working space, and each area in the working space Unbalanced temperature, and the speed of multiple trays cannot be adjusted independently, resulting in uneven quality of the epitaxial layer produced

Method used

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0032] It should be noted that when a component is said to be "mounted on" another component, it may be directly mounted on another component or there may be an intervening component. When a component is said to be "set on" another component, it may be set directly on the other component or there may be an intervening component at the same time. When a component is said to be "fixed" to another component, it may be directly fixed to the other component or ther...

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Abstract

The invention provides an epitaxial growth device which comprises an induction coil and a reaction body, and the induction coil is arranged on the peripheral side of the reaction body in a surrounding mode; the reaction body comprises a heating seat and a plurality of trays; a plurality of working spaces are arranged in the heating seat, the trays are positioned in the working spaces, and each tray corresponds to one working space; wherein the trays are used for bearing a substrate, and each tray can independently rotate relative to the heating seat. The epitaxial growth device provided by the invention is provided with a plurality of working spaces, and a plurality of epitaxial layers can be generated simultaneously, so that the working efficiency is improved, and the yield is effectively improved; meanwhile, through independent control over the multiple trays, it is guaranteed that the quality of products produced on each tray is good, and the quality of products produced in the same batch is consistent.

Description

technical field [0001] The invention relates to the technical field of semiconductor epitaxial growth, in particular to an epitaxial growth device. Background technique [0002] Epitaxial growth is an important part of the semiconductor industry chain. The quality of epitaxial films directly restricts the performance of subsequent devices. With the increasing demand for high-quality semiconductor devices in the industry, high-efficiency and high-quality epitaxial equipment has been obtained. More and more attention. [0003] Epitaxial growth mainly refers to the growth of a layer of high-quality film on the substrate. There are many methods for growing epitaxial layers, but the most commonly used method is chemical vapor deposition (CVD). Chemical vapor deposition refers to chemical gas or vapor in the substrate A method of surface reaction synthesis of coatings or nanomaterials; two or more reaction media (the reaction media is usually gaseous) are introduced into a workin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/458
CPCC23C16/4586C23C16/4581Y02P70/50
Inventor 朱亮沈文杰周建灿程佳峰张秋成傅林坚曹建伟杨奎
Owner ZHEJIANG QIUSHI SEMICON EQUIP CO LTD
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