Magnetic confinement radio frequency inductive coupling plasma source

Abstract

The invention belongs to the plasma technology, and particularly relates to a magnetic confinement radio frequency inductive coupling plasma source which comprises a radio frequency discharge cavity, a radio frequency antenna, a high-voltage insulation gas circuit, a magnetic field power supply and a radio frequency power supply, the radio frequency feed-in end of the radio frequency antenna is connected with the radio frequency power supply and is connected with one output port of the magnetic field power supply; the grounding end of the radio frequency antenna is grounded and is connected with the other output port of the magnetic field power supply; the lower end of the radio frequency discharge cavity is open and the upper end is closed. The device generates an electromagnetic field for radio frequency inductively coupled plasma discharge, restrains a static magnetic field of plasma, simplifies a discrete radio frequency antenna and magnetic field coil structure of a traditional magnetic confinement radio frequency inductively coupled plasma source, shortens the distance between the radio frequency antenna and the magnetic field coil of the plasma source and a discharge cavity, and therefore, the effect of the electromagnetic field generated by the radio frequency antenna and the constraint static magnetic field on the discharge plasma is enhanced.

Description

technical field [0001] The invention belongs to plasma technology, and in particular relates to a magnetically confined radio frequency inductively coupled plasma source. Background technique [0002] As a high-density discharge plasma source, RF inductively coupled plasma source has been widely used in plasma etching, thin film material preparation, material surface modification and light source due to its characteristics of no electrode pollution and simple equipment structure. field. [0003] The traditional radio frequency ion source consists of a plasma discharge chamber, radio frequency antenna, radio frequency power supply, gas system, etc. The plasma discharge chamber is a cylindrical structure of ceramic or quartz glass material, and the radio frequency antenna is wound outside the discharge chamber. In order to prevent the plasma from bombarding and polluting the inner wall of the discharge chamber, a metal cylinder (Faraday shielding cylinder) with axial slits is...

AI Technical Summary

Problems solved by technology

These permanent magnets or electromagnetic coils will form eddy currents under the action of radio frequency electromagnetic fields, thereby increasing radio frequency loss and reducing the discharge efficiency of radio frequency plasma sources; and in order to maintain the performance of permanent magnets or electromagnetic coils, special water cooling structures need to be added. increases the structural size and complexity of the plasma source

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