Preparation method and application of anti-ultraviolet dendritic silicon dioxide nanomaterial

A technology of silica and nanomaterials, applied in the field of plastic additives and anti-aging of plastics, can solve the problems of inorganic ultraviolet shielding agents easy to agglomerate, accelerate polymer degradation, affect the light transmittance of substrates, etc., to improve anti-UV aging. Effect, low concentration of use, beneficial to environmental protection

Active Publication Date: 2021-12-03
广东省科学院生物与医学工程研究所
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are obvious defects in the use of inorganic ultraviolet shielding agents: on the one hand, inorganic ultraviolet shielding agents are easy to agglomerate during polymer processing or use; on the other hand, the UV protection effect is single or has strong coloring, such as silica only It has a shielding effect, and adding too much will affect the light transmittance of the substrate; third, semiconductor light shielding agents are prone to produce side reactions after absorbing UV to accelerate polymer degradation, such as iron oxide and zinc oxide, which are prone to reductive free radicals and oxidative cavities, causing degradation or crosslinking of the polymer matrix

Method used

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  • Preparation method and application of anti-ultraviolet dendritic silicon dioxide nanomaterial
  • Preparation method and application of anti-ultraviolet dendritic silicon dioxide nanomaterial
  • Preparation method and application of anti-ultraviolet dendritic silicon dioxide nanomaterial

Examples

Experimental program
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Effect test

Embodiment 1

[0024] 12g tetraethyl orthosilicate, 1g γ-aminopropyltriethoxysilane, 1.0g 3-[3-(2-H-benzotriazol-2-yl)-4-hydroxy-5-tert-butyl Base phenyl]-propionic acid-polyethylene glycol 300 ester and 0.8g cetyltrimethylammonium bromide are dissolved in the mixed solvent of 250mL ethanol / water volume ratio 4:1, use ammonia water to adjust pH to 9, Stir and react at 25°C for 3 hours; wash the resulting reaction product with absolute ethanol, filter, and freeze-dry to obtain the anti-ultraviolet dendritic silica nanomaterial SiO 2 -1, its TEM image is shown in figure 1 , the nitrogen adsorption-desorption curve is shown in figure 2 , the ultraviolet-infrared absorption spectrum of the ethanol dispersion solution of anti-ultraviolet dendritic silica nanomaterials is shown in image 3 . figure 1 It can be seen that SiO 2 -1 is a sphere with a diameter of 250 nm, and has a dendritic structure extending from the center to the surroundings.

Embodiment 2

[0032] 13g tetraethyl orthosilicate, 2.0g 3-[3-(2-H-benzotriazol-2-yl)-4-hydroxy-5-tert-butylphenyl]-propionic acid-polyethylene Alcohol 300 ester and 0.8g of cetyltrimethylammonium bromide were dissolved in 250mL of ethanol / water (volume ratio 4:1) solvent, and the pH was adjusted to 10 with ammonia water, and the reaction was stirred at 40°C for 10 hours; The resulting reaction product is washed with absolute ethanol, filtered, and freeze-dried to obtain the anti-ultraviolet dendritic silica optical nanomaterial SiO 2 -2.

[0033] The main difference between Example 2 and Example 1 is that a single silicon source is used and the content of UV absorber is increased. In 2 hours, the reaction product was less, and the reaction temperature and the reaction time were prolonged to produce a sufficient amount of white product.

Embodiment 3

[0035] Mix 12g tetraethyl orthosilicate, 1g γ-aminopropyltriethoxysilane, 1.5g 4-(4,6-diphenyl-S-triazine)-1,3-resorcinol with 0.8g Hexadecyltrimethylammonium bromide is dissolved in the solvent of 250mL ethanol / water (volume ratio 4:1), uses ammonia water to adjust pH to 9, stirs reaction at 25 ℃ for 2 hours; Washing, filtering, and freeze-drying to obtain the anti-ultraviolet dendritic silica nanomaterial SiO 2 -3.

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Abstract

The invention discloses a preparation method and application of an anti-ultraviolet dendritic silicon dioxide nanomaterial. The dendritic silicon dioxide nanomaterial loaded with an organic ultraviolet (UV) absorbing group is formed in situ through a simple liquid phase method, and the prepared anti-ultraviolet dendritic silicon dioxide nanomaterial has dual effects of UV shielding and absorption, is good in anti-ultraviolet aging effect, does not generate side reactions for accelerating polymer degradation, is an efficient, multifunctional and environment-friendly plastic additive, has important application prospects in the plastic industry, meets the development requirements of green chemistry, and is beneficial for environmental protection.

Description

Technical field: [0001] The invention relates to the fields of plastic additives and plastic anti-aging, in particular to a preparation method and application of an anti-ultraviolet dendritic silica nanometer material. Background technique: [0002] UV aging resistance is a technical problem that must be faced in the outdoor application of plastic products. When high-energy ultraviolet rays irradiate the surface of plastics, the superficial polymer crosslinking caused will affect the photochemical properties, biological properties and mechanical strength of plastic products, and affect the service life and later recycling of plastic products. Especially for transparent plastic film materials (thickness 5-100μm) used outdoors, the entire substrate is equivalent to a shallow surface layer, and ultraviolet aging causes comprehensive aging of the material, rapidly reducing its outdoor service life. It is considered to be the most economically feasible method for industrializati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12B82Y40/00C08K7/00C08K3/36C08J5/18C08L67/02C08L67/04
CPCC01B33/12B82Y40/00C08K7/00C08K3/36C08J5/18C08K2201/011C08J2367/02C08J2467/02C01P2004/04C01P2006/17C01P2002/84
Inventor 孙晓燕谢东王珂赵阳李发勇刘海露
Owner 广东省科学院生物与医学工程研究所
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