Suppression method for partial discharge at flange of GIS/GIL supporting insulator
A technology for supporting insulators and partial discharges, applied in insulators, processing data acquisition/processing, circuits, etc., can solve problems such as difficulty in hindering the movement of micron-level particles, and achieve high-precision manufacturing, good compatibility, and interface bonding strength high effect
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Embodiment 1
[0076] Example 1: 110KV disk support insulator
[0077] 1) Optimization of dielectric parameters of the insulator flange side
[0078] The two-dimensional axisymmetric structure of 110kV disk support insulator is like figure 2 (a) shown, in order to optimize the dielectric constant, support the root of the insulator 1 The area is a domain-based domain, and the arrow is an optimized target area Ω. 2 Ω 3 Mathematical description of the optimization problem, as design variables are designed to design a line of domain Ω 1 The dielectric constant in any mesh, the optimization target is divided into two parts, F 1 For electric field points, used to reduce optimization target area Ω 2 Ω 3 Internal electric field model. C ref1 And C ref2 F 1 The normalization parameters of the medium two optimization components make the value obtained in the initial calculation process, thereby increasing the convergence speed of the algorithm. fly 2 For gradient penalties, it is used to prevent numerical...
Embodiment 2
[0089] Example 2: 110kV Basin Support Insulator
[0090] 1) Optimization of dielectric parameters of the insulator flange side
[0091] 110kV disk support insulator to optimize the dielectric constant, support the root of the insulator 1 The area is a domain-based domain, and the arrow is an optimized target area Ω. 2 Ω 3 Mathematical description of the optimization problem is as designable to design a line of domain Ω 1 The dielectric constant in any mesh, the optimization target is divided into two parts, F 1 For electric field points, used to reduce optimization target area Ω 2 Ω 3 Internal electric field model. C ref1 And C ref2 F 1 The normalization parameters of the medium two optimization components make the value obtained in the initial calculation process, thereby increasing the convergence speed of the algorithm. fly 2 For gradient penalties, it is used to prevent numerical instability of "chessboard", improve the optimization of the manufacture of high dielectric insula...
Embodiment 3
[0102] Example 3: 550kV Basin Support Insulator
[0103] 1) Optimization of dielectric parameters of the insulator flange side
[0104] The two-dimensional axisymmetric structure of the 550kV basin support the insulator such as figure 2 (b) shown, in order to optimize the dielectric constant, support the root of the insulator 1 The area is a domain-based domain, and the arrow is an optimized target area Ω. 2 , Mathematical description of the optimization problem is 5, design variables are designed to be domain Ω 1 The dielectric constant in any mesh, the optimization target is divided into two parts, F 1 For electric field points, used to reduce optimization target area Ω 2 Ω 3 Internal electric field model. C ref Forth 1 The normalization parameters of the medium two optimization components make the value obtained in the initial calculation process, thereby increasing the convergence speed of the algorithm. fly 2 For gradient penalties, it is used to prevent numerical instability...
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