Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A superhydrophobic modification method for greenhouse films

A super-hydrophobic modification and greenhouse film technology, applied in the field of super-hydrophobic modification of greenhouse films, can solve problems such as damage, unfavorable plant growth, and poor film hydrophobicity

Active Publication Date: 2022-04-05
ZHEJIANG UNIV
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] There are two reasons why these plastic films are discarded. One is that they are severely damaged during daily use, and the other is that the light transmittance decreases significantly after long-term use, which is not conducive to the growth and development of plants in the greenhouse.
The damage of the film is caused by improper use and environmental factors (such as violent wind and rain), which is usually unavoidable. However, the existing film has poor hydrophobicity. After long-term use, it often becomes gray, which is not conducive to plant growth and has to be replaced.
Although it is impossible to artificially intervene in natural factors without destroying the film, more attention can be paid during use so as not to cause additional damage to it. The existing technology lacks some technical means to modify the film to increase their hydrophobicity.
[0005] Existing superhydrophobic modification technologies include wax curing, template method, physical / chemical vapor deposition method, etching method, photolithography, etc. These technologies either require expensive silicon molds to manufacture nanostructures, or require high temperature, vacuum, etc. and other conditions, and the manufacturing process is relatively complicated
They are neither suitable for large-scale practical applications nor for plastic films

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A superhydrophobic modification method for greenhouse films
  • A superhydrophobic modification method for greenhouse films
  • A superhydrophobic modification method for greenhouse films

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0036] 1) placing the PE film in an inductively coupled plasma etcher;

[0037] 2) The set ICP power is 100W, the RF power is 50W; the gas selection is O 2 and CHF 3 , O 2 and CHF 3 The flow rate is set to 15:45sccm, and the air pressure is 30 millitorr; the upper surface of the PE film is etched for 10 minutes by an inductively coupled plasma etcher, so that a nano-textured structure is formed on the upper surface of the PE film, and the nanometer textured structure is obtained. Structured PE film;

[0038] 3) The ICP power is set to 100W, the RF power is 50W, and the gas is only carbon tetrafluoride C 4 f 8 , C 4 f 8 The flow rate is set to 50sccm; the air pressure is 30mTorr; the upper surface of the PE film is deposited by an inductively coupled plasma etching instrument for 30s, so that a layer of fluorocarbon layer is deposited on the upper surface of the nano-textured structure on the PE film, and the improvement is completed. Sex and take out.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a superhydrophobic modification method for greenhouse films. The PE film is placed in an inductively coupled plasma etcher; the upper surface of the PE film is etched for a period of time by an inductively coupled plasma etcher, so that a nano-textured structure is formed on the upper surface of the PE film; The plasma etching instrument deposits the upper surface of the PE film for a period of time, so that a layer of fluorocarbon layer is deposited on the surface of the nano-textured structure of the PE film, and the modification is completed and taken out. The invention uses a two-step treatment method of inductively coupled plasma etching to build a nano-texture structure on the surface of the film and cover a layer of low surface energy material, endowing the film with excellent super-hydrophobic properties and self-cleaning ability.

Description

technical field [0001] The invention relates to a film modification preparation method of superhydrophobic modification technology, in particular to a superhydrophobic modification method for greenhouse films. Background technique [0002] A greenhouse is a closed structure that uses solar radiation to create a microclimate suitable for plant growth, and is one of the typical forms of agricultural production. The components involved in a greenhouse usually include covering material, framework, cultivation facilities and technical equipment required to control the microclimate inside the greenhouse. Among them, the covering material is the most important component of the greenhouse, and plastic films are generally the most commonly used, especially polyethylene (PE) films are the most widely used. The service life of these plastic films is generally about one year. During use, dust and grass clippings in the environment often adhere to the surface of the film, and due to the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/02C23C14/06B82Y30/00B82Y40/00
CPCC23C14/022C23C14/0694B82Y30/00B82Y40/00
Inventor 平建峰张琪应义斌
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products