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Processing method and processing device of glass substrate

A glass substrate and processing method technology, which is applied to stone processing tools, grinding devices, stone processing equipment, etc., can solve the problem of low yield rate of glass substrates, and achieve the effects of reducing cleaning difficulty, improving yield, and reducing dust particles.

Pending Publication Date: 2021-05-25
WUHU TUNGHSU PHOTOELECTRIC SCI & TECHCO +2
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The purpose of this disclosure is to provide a processing method for glass substrates, which can solve the technical problem of low yield rate of glass substrates

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  • Processing method and processing device of glass substrate
  • Processing method and processing device of glass substrate

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Embodiment Construction

[0021] Specific embodiments of the present disclosure will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present disclosure, and are not intended to limit the present disclosure.

[0022] In the present disclosure, the terms "first and second" are used to distinguish one element from another without any contrary description, and do not have sequence or importance. In addition, when the following description refers to the drawings, the same reference numerals in different drawings represent the same or similar elements, and the present disclosure will not repeat them here.

[0023] According to a specific embodiment of the present disclosure, a method for processing a glass substrate is provided, referring to figure 1 and figure 2 As shown in , the processing method includes the following steps: loading: placing the glass substrate 10...

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Abstract

The invention relates to a processing method and a processing device of a glass substrate. The processing method comprises the following steps: loading: placing the glass substrate (100) on a loading mechanism (1), and conveying the glass substrate to a cutting mechanism (2) by the loading mechanism (1); cutting: cutting and breaking off the glass substrate (100) by adopting the cutting mechanism (2); dust removal: while the cutting mechanism (2) cuts and breaks off the glass substrate (100), adopting a dust removal mechanism to carry out dust removal treatment on the cut part and the broken part of the glass substrate (100); grinding: grinding the edge part of the cut glass substrate (100) by adopting a grinding mechanism (4); and cleaning: cleaning the ground glass substrate (100) by using a cleaning mechanism (5). The processing method can solve the technical problem of low yield of the glass substrate.

Description

technical field [0001] The present disclosure relates to the technical field of glass substrate processing, and in particular, to a glass substrate processing method and a processing device thereof. Background technique [0002] In the processing of glass substrates, usually starting from the loading process, cutting, grinding, cleaning, inspection, and finally packaging, and the processing of glass substrates requires precise control of the process and environment of each process in order to ensure the quality of glass substrates. Reduced product exception in client side. In the related art, the glass substrate is an important component of liquid crystal glass. During the production process of the glass, defects such as high particle size on the surface of the glass substrate often occur, resulting in a low yield rate of the glass substrate. Contents of the invention [0003] The purpose of the present disclosure is to provide a method for processing a glass substrate, w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B28D1/24B28D7/00B28D7/02B28D7/04B24B9/10B24B27/00B24B37/00B24B55/02B08B11/04
CPCB28D1/24B28D7/005B28D7/04B28D7/02B28D7/00B24B9/10B24B37/00B24B27/0076B24B55/02B08B11/04
Inventor 李青李赫然方红义陈涛涛吴亚平付继龙胡芳林周荧彬王军杨善方董光明石志强李震李俊生
Owner WUHU TUNGHSU PHOTOELECTRIC SCI & TECHCO
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