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High-reliability GaN-based power device and preparation method thereof

A gallium nitride-based, power device technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of current collapse, output current reduction, etc., to improve the current collapse effect, increase the energy band, The effect of broad application prospects

Active Publication Date: 2021-04-02
SHANGHAI UNIV OF ENG SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although the performance of GaN-based power devices is constantly making breakthroughs, the large-scale commercial application of the device is still limited by various electrical reliability problems, one of which is the current collapse, that is, the device is under a large electric field stress. or in case of large current stress, the output current decreases

Method used

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  • High-reliability GaN-based power device and preparation method thereof
  • High-reliability GaN-based power device and preparation method thereof
  • High-reliability GaN-based power device and preparation method thereof

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Embodiment Construction

[0023] The specific implementation manner of the present invention will be described in detail below in conjunction with the accompanying drawings and preferred embodiments.

[0024] The present invention provides a high-reliability GaN-based power device, such as figure 1 and 2 As shown, this chip is covered with a layer of isolation layer, that is, AlN film, on the AlGaN layer in the area between the gate electrode and the drain electrode. Since the matching degree between the AlN film and the AlGaN layer is good, the number of electron traps at the AlGaN / AlN interface will be large. In order to reduce; at the same time, fluorine ion implantation is performed on the isolation layer and the passivation layer above it, because the fluorine ion has a strong electronegativity, it can increase the energy band of the region, thereby effectively preventing electrons from entering the trap. Specifically, this The inventive high-reliability gallium nitride-based power device include...

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Abstract

The invention belongs to the technical field of semiconductors, and discloses a high-reliability GaN-based power device, which comprises a substrate and a GaN-based layer from bottom to top, and is characterized in that a source electrode and a drain electrode are respectively arranged at two ends of the GaN-based layer, a gate electrode is arranged in the middle of the GaN-based layer, a barrierlayer and a passivation layer are further arranged in an area between the gate electrode and the drain electrode from bottom to top, only the passivation layer is arranged in an area between the gateelectrode and the source electrode, and the barrier layer is used for reducing the number of electron traps in the GaN-based layer and preventing electrons of the gate electrode from entering the electron traps. The invention further discloses a preparation method of the high-reliability GaN-based power device. According to the preparation method, the etching process can be accelerated, the flatness of the surface of the groove after etching can be ensured, and a better choice is provided for industrial application of a groove method.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a high-reliability gallium nitride-based power device and a preparation method. Background technique [0002] Due to the superior physical properties of gallium nitride GaN materials such as large band gap, strong breakdown electric field, high electron mobility and high saturation electron drift velocity, GaN-based electronic devices are more suitable for high-temperature, high-voltage and high-temperature applications than silicon-based electronic devices. work under extreme conditions such as frequency. In particular, GaN-based power devices based on AlGaN / GaN heterojunctions have become core devices in the fields of power electronics, wireless communications, and radar due to their good high-frequency and high-power characteristics. However, although the performance of GaN-based power devices is constantly making breakthroughs, the large-scale commercial application o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/06H01L29/778H01L21/3115H01L21/335
CPCH01L29/0653H01L29/7787H01L29/66462H01L21/31155
Inventor 郝惠莲
Owner SHANGHAI UNIV OF ENG SCI
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