Preparation method of silicon dioxide abrasive for high-density and high-dispersion toothpaste
A silicon dioxide, high-dispersion technology, applied in chemical instruments and methods, medical preparations containing active ingredients, cosmetic preparations, etc. The effect of low content, low copper consumption and low oil absorption value
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Embodiment 1
[0028] Embodiment 1, a kind of preparation method of silicon dioxide friction agent for high-density high-dispersion toothpaste
[0029] The preparation method of described high-density high-dispersion toothpaste with silicon dioxide friction agent, comprises the following steps:
[0030] S1. After liquefying solid sodium silicate with a modulus of 3.5 at high temperature, add water to form a sodium silicate solution with a concentration of 3.0mol / L;
[0031] S2, configuration concentration is that the sulfuric acid solution of 10.0mol / L and the sodium sulfate solution that mass percent is 3.0%;
[0032] S3, add 12m in the reactor 3 The sodium sulfate solution that step S2 makes and 2m 3 For sulfuric acid solution, heat up to 50°C, turn on the stirring device, the stirring frequency is 70Hz, and 3 Add the sodium silicate solution prepared in step S1 dropwise at a speed of 1 / h, and control the reaction end point pH value to be 6.5;
[0033] S4. Raise the temperature to 75°C...
Embodiment 2
[0036] Embodiment 2, a kind of preparation method of silicon dioxide friction agent for high-density high-dispersion toothpaste
[0037] The preparation method of described high-density high-dispersion toothpaste with silicon dioxide friction agent, comprises the following steps:
[0038] S1. After liquefying solid sodium silicate with a modulus of 1.5 at high temperature, add water to form a sodium silicate solution with a concentration of 1.5mol / L;
[0039] S2, configuration concentration is that the sulfuric acid solution of 6.0mol / L and the sodium sulfate solution that mass percentage is 0.5%;
[0040] S3, add 8m in the reactor 3 The sodium sulfate solution that step S2 makes and 0.5m 3 For sulfuric acid solution, heat up to 25°C, turn on the stirring device, the stirring frequency is 50Hz, and 3 Add the sodium silicate solution prepared in step S1 dropwise at a speed of 1 / h, and control the reaction end point pH value to be 3.5;
[0041] S4. Raise the temperature to 5...
Embodiment 3
[0044] Embodiment 3, a kind of preparation method of silicon dioxide friction agent for high-density high-dispersion toothpaste
[0045] The preparation method of described high-density high-dispersion toothpaste with silicon dioxide friction agent, comprises the following steps:
[0046] S1. After liquefying solid sodium silicate with a modulus of 2.0 at high temperature, add water to prepare a sodium silicate solution with a concentration of 2.2mol / L;
[0047] S2, configuration concentration is that the sulfuric acid solution of 7.5mol / L and the sodium sulfate solution that mass percent is 1.5%;
[0048] S3, add 9m in the reactor 3 The sodium sulfate solution that step S2 makes and 1.0m 3 For sulfuric acid solution, heat up to 35°C, turn on the stirring device, the stirring frequency is 60Hz, and 3 Add the sodium silicate solution prepared in step S1 dropwise at a speed of 1 / h, and control the reaction end point pH value to be 4.5;
[0049] S4. Raise the temperature to 5...
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