Treatment method of industrial wastewater with high organic matter content and high arsenic content
A treatment method and technology for industrial wastewater, applied in water/sewage treatment, adsorption water/sewage treatment, neutralized water/sewage treatment, etc., can solve the problems of limiting organic matter removal efficiency, unfavorable microbial growth, and inability to use biochemical methods
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Embodiment 1
[0061] This embodiment provides a treatment method for photovoltaic semiconductor industrial wastewater with high organic matter and high arsenic content, specifically as follows:
[0062] (1) pH adjustment: import 5L of industrial wastewater into the oxidation treatment organic matter reaction tank, add hydrochloric acid to adjust the pH of the industrial wastewater to 4;
[0063] (2) Oxidation treatment to remove organic matter: add ferrous sulfate to its final concentration of 1.6mol / L, stir for 7min, add hydrogen peroxide to its final concentration of 4mol / L, stir for 30min, and oxidize the precipitation of wastewater after treatment and supernatant separation;
[0064] (3) First-level precipitation to remove arsenic: the waste water supernatant obtained in step (2) is introduced into the first-level arsenic removal coagulation sedimentation tank, and the gas-water volume ratio is 3:1. Ferric chloride until its final concentration in the wastewater treatment system is 1mo...
Embodiment 2
[0069] This embodiment provides a treatment method for photovoltaic semiconductor industrial wastewater with high organic matter and high arsenic content. The difference from Example 1 is that the resin columns used in step (5) are different: the resin columns used include iron carbon from bottom to top. Catalyst particle layer, iron sand filter material, sea sand filter material, special arsenic removal resin layer; the thickness of iron-carbon catalyst particle layer, iron sand filter material, sea sand filter material, and special arsenic removal resin layer is 150mm, 150mm, 250mm, 800mm .
Embodiment 3
[0071] This embodiment provides a treatment method for photovoltaic semiconductor industrial wastewater with high organic matter and high arsenic content. The difference from Example 1 is that in step (3) "add ferric chloride until its final concentration in the wastewater treatment system is 1mol / L" is replaced with "Add ferric sulfate until its final concentration in the wastewater treatment system is 4.8mol / L".
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