Copper manganese alloy type magnetic spin valve
A copper-manganese alloy and magnetic spin technology, which is applied in the field of magnetic spin valves and copper-manganese alloy magnetic spin valves, can solve the problems of poor magnetoresistance loop symmetry, cumbersome and complicated processes, etc.
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Embodiment 1
[0011] The copper-manganese alloy CuMn is used to replace the non-magnetic intermediate layer, and the composition of the CuMn alloy film is Cu 94 mn 6 . Prepared by magnetron DC sputtering process, the substrate is silicon wafer Si, the thickness of the bottom Co layer is kept constant at 2nm, and the middle layer Cu 94 mn 6 The thickness is 1.2nm. The background vacuum during preparation is 4.6×10 -5 Pa, Ar gas pressure during sputtering is 0.3Pa. The CuMn alloy was sputtered by direct current, and the sputtering current was 40mA; the Co magnetic layer was sputtered by radio frequency, and the sputtering power was 160W. The deposition rates of Co and CuMn during the preparation were 0.08 and 0.1 nm / s, respectively.
[0012] Co / Cu prepared by this method 94 mn 6 The front and back switching fields (or saturation fields) of the (1.2nm) / Co system are ±0.8kA / m and ±2.4kA / m respectively, the giant magnetoresistance value is 3.0%, and its double-peak structure is very flat...
Embodiment 2
[0014] The copper-manganese alloy CuMn is used to replace the non-magnetic intermediate layer, and the composition of the CuMn alloy film is Cu 94 mn 6 . Prepared by magnetron DC sputtering process, the substrate is silicon wafer Si, the thickness of the bottom Co layer is kept constant at 2nm, and the middle layer Cu 94 mn 6 The thickness is 1.2 nm, and the thickness of the buffer layer and the cover layer are both 5 nm. The background vacuum during preparation is 4.6×10 -5 Pa, Ar gas pressure during sputtering is 0.3Pa. The CuMn alloy was sputtered by direct current, and the sputtering current was 40mA; the Co magnetic layer was sputtered by radio frequency, and the sputtering power was 160W. The deposition rates of Co and CuMn during the preparation were 0.08 and 0.1 nm / s, respectively.
[0015] Cu prepared by this method 94 mn 6 / Co / Cu 94 mn 6 (1.2nm) / Co / Cu 94 mn 6 The front and back switching fields (or saturation fields) of the structural spin valve are only ...
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