Top nailing type copper manganese alloy magnetic spin valve
A technology of copper-manganese alloy and magnetic spin, which is applied in the field of material engineering, can solve problems affecting the application of spin valves, poor symmetry of magnetoresistance loops, and insufficiently wide and flat steps, achieving significant progress and practical value, spin Effects of valve performance improvement and magnetoresistance value improvement
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment
[0010] The substrate of the magnetic spin valve is a silicon wafer Si, the thickness of the Co layer is kept constant at 2.0nm, and the composition of the CuMn alloy film in the middle layer is Cu 94 mn 6 , prepared by Cu and Mn composite target, its thickness is 1.2nm. Prepared by magnetron sputtering process, the background vacuum is 4.6×10 -5 Pa, the Ar gas pressure during sputtering was 0.3 Pa, and the sputtering current was 40 mA. The deposition rates of Co and CuMn during the preparation were 0.08 and 0.1 nm / s, respectively. The bottom layer Co (2.0nm) and the first half Co layer (1.0nm) of the upper pinning layer Co-CoO were obtained by radio frequency sputtering with a power of 160W, and the second half CoO was obtained by 5:2 Ar gas and O 2 The gas is mixed and prepared by reaction. The sputtering power is still 160W. After completion, it is obtained by high-temperature oxidation at 160 degrees with high-purity oxygen for two hours after leaving the vacuum chamber....
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com