MoS2/YSZ (molybdenum disulfide/yttria stabilized zirconia) composite film with high wear resistance and radiation resistance and preparation method of MoS2/YSZ composite film
A technology of yttrium-stabilized zirconia and composite thin films, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of rapid lubricating failure, lowering the dislocation threshold, increasing the unsaturated vacancies of MoS2 crystals, etc. , to achieve the effect of good crystallization performance
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[0026] The following specific examples of MoS of the present invention 2 / YSZ film preparation and properties for further explanation.
[0027] Equipment used: RF magnetron sputtering system manufactured by Shen Keyi Co., Ltd., Chinese Academy of Sciences, model JS-600. The system is mainly composed of a deposition chamber, a substrate plate, a DC power supply, two RF power supplies, a bias power supply and a set of vacuum pumping devices. The sputtering power supply is connected to the target, and the bias voltage is connected to the substrate. The annealing equipment was manufactured by Hefei Kejing Material Technology Co., Ltd., and the model is OTF-1200X.
[0028] Clean the silicon substrate: put the monocrystalline silicon (001) in anhydrous acetone and ultrasonically clean it for 10 minutes, then place it in anhydrous ethanol for 10 minutes, dry it with an air gun and place it in a deposition chamber.
[0029] Vacuuming: First use a mechanical pump to pump the air pres...
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