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Substrate for polymer brush formation, production method for substrate for polymer brush formation, and precursor liquid for use in production method for substrate for polymer brush formation

A technology of polymer brushes, manufacturing methods, applied in the field of precursor fluids, capable of solving problems such as without any research

Active Publication Date: 2020-08-14
NAT INST OF ADVANCED IND SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0013] However, this patent document proposes to obtain a polymer brush exhibiting excellent oil repellency after immersion in an aqueous solution of a predetermined pH. In order to achieve this purpose, "2-bromo "Isobutyryl" is introduced into the fixed surface to polymerize specific water-soluble monomers, so no research has been done on the method of easily and uniformly forming various polymer brushes on the surface of various large-area substrates

Method used

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  • Substrate for polymer brush formation, production method for substrate for polymer brush formation, and precursor liquid for use in production method for substrate for polymer brush formation
  • Substrate for polymer brush formation, production method for substrate for polymer brush formation, and precursor liquid for use in production method for substrate for polymer brush formation
  • Substrate for polymer brush formation, production method for substrate for polymer brush formation, and precursor liquid for use in production method for substrate for polymer brush formation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0181] For a mixed solution of 0.01M HCl aqueous solution (1 volume part), TEOS (2.8 volume parts), EtOH (8 volume parts), add chloromethylphenylethyltrimethoxysilane (0.0088, 0.141, 0.564 volume parts: sequentially referred to as Example 1-1, 1-2, 1-3) or chloromethylphenyltrimethoxysilane (0.564 parts by volume: referred to as Example 1-4), and stirred at room temperature for 24 hours to prepare a precursor liquid. This precursor solution was dropped onto a silicon wafer, spin-coated (2000 rpm / 10 seconds), and dried at room temperature for 24 hours to form a polymerization initiation layer on the surface of the silicon wafer.

[0182] 2-(Dimethylamino)ethyl methacrylate (5.5 parts by volume), copper (II) chloride (4 parts by volume), N,N,N',N",N"-pentamethyldi Ethyltriamine (7 parts by volume), sodium ascorbate (1 part by volume), and water (1 part by volume) were mixed to prepare a polymerization solution. The aforementioned silicon wafer on which the polymerization initia...

Embodiment 2

[0189] For a mixed solution of 0.01M HCl aqueous solution (1 volume part), TEOS (2.8 volume parts), EtOH (8 volume parts), add chloromethylphenylethyltrimethoxysilane and phenyltriethoxysilane (0.5076 Parts by volume and 0.0564 parts by volume, 0.3948 parts by volume and 0.1692 parts by volume, 0.282 parts by volume and 0.282 parts by volume: successively referred to as Example 2-1, 2-2, 2-3), stirred at room temperature for 24 hours, and prepared the precursor liquid . This precursor solution was dropped onto a silicon wafer, spin-coated (2000 rpm / 10 seconds), and dried at room temperature for 24 hours to form a polymerization initiation layer on the surface of the silicon wafer.

[0190] 2-(Dimethylamino)ethyl methacrylate (5.5 parts by volume), copper (II) chloride (4 parts by volume), N,N,N',N",N"-pentamethyldi Ethyltriamine (7 parts by volume), sodium ascorbate (1 part by volume), and water (1 part by volume) were mixed to prepare a polymerization solution. The aforemen...

Embodiment 3

[0196] In this example, silicon wafers were formed using the polymerization initiating layers of Examples 1-3 above, and various polymer brushes were produced under the following conditions.

[0197] The aforementioned silicon wafer formed with the polymerization initiating layer was mixed with various monomers (parts by volume recorded in Table 3), copper (II) chloride (4 parts by volume), N, N, Immerse in the polymerization solution prepared by mixing N', N", N"-pentamethyldiethylenetriamine (7 parts by volume), sodium ascorbate (1 part by volume), water or ethanol (1 part by volume) for 2 hours , forming polymer brushes on the substrate surface (Examples 3-1 to 3-16).

[0198] Table 2 shows the measurement results and appearance of the static contact angle with respect to water of the obtained polymer brush.

[0199] [table 3]

[0200]

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Abstract

The purpose of the present invention is to provide an object, provided is a surface treatment technique capable of imparting an excellent surface function to the surfaces of various large-area substrates. A precursor liquid containing organosilane and a metal alkoxide is applied to a substrate. When a polymerization initiating layer is formed by using a sol-gel method, the organosilane, uses x-R <1 >-(Ph) k-(R < 2 >) m-Si-R < 3 > nR < 4 > < 3 >-n, wherein x represents a halogen atom, R1 represents an alkylene group having 1 to 3 carbon atoms, Ph represents a phenylene group, R2 represents analkylene group having 1 to 10 carbon atoms which may be separated by an oxygen atom, R3 represents an alkoxy group having 1 to 3 carbon atoms or a chlorine group, R4 represents an alkyl group having 1to 6 carbon atoms, k is 0 or 1, m is 0 or 1, and n is 1, 2 or 3). The present invention also relates to the organosilane that contains a polymerization initiator group.

Description

technical field [0001] The present invention relates to a base for forming a polymer brush, and more particularly, to a base for forming a polymer brush capable of forming a polymer brush starting from the polymerization initiating layer by coating the surface of a substrate with a polymerization initiating layer, a method for forming the base, and the base. The precursor fluid used in the method. Background technique [0002] Polymer brushes have attracted attention as effective surface modification materials for solid surfaces. A polymer brush is formed by forming a polymerization initiation layer on the surface of a substrate, then bringing the polymerization initiation layer into contact with a monomer and a polymerization catalyst to polymerize the monomer, and extending the polymer chain from the surface of the polymerization initiation layer. In the polymerization of the body, it is preferable to use a surface-initiated atom transfer radical polymerization method (SI...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F2/00C03C17/30C08F4/40C08F292/00C08J7/04C23C26/00C08J7/043C08J7/054
CPCC08F2/00C08F4/40C08F292/00C23C26/00C03C17/009C08J2483/08C08J7/0427C08J7/0423C23C18/2053C23C18/30C23C18/405C08J7/043C08J7/054C08F2438/01C08F220/34C03C17/30C03C2218/114C08J2383/08C23C18/2086C08G77/14C08G77/58C08G77/18C09D183/06B32B27/283C08G77/04C08G77/24C09D183/04
Inventor 佐藤知哉浦田千寻穗积笃
Owner NAT INST OF ADVANCED IND SCI & TECH
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