Needle-shaped alumina carrier
An alumina carrier and alumina technology, which is applied in the field of catalyst carrier preparation and gas-solid phase reaction, can solve the problems of few acupuncture alumina preparation methods and few acupuncture alumina anodes.
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Embodiment 1
[0054] A needle-shaped alumina carrier, comprising the steps of:
[0055] (1) Pretreatment of silicon-based materials: Cut the monocrystalline silicon wafer to a suitable size, and then undergo ultrasonic cleaning with ethanol, acetone, and deionized water to remove oil stains. The number of cleanings is once, and then soak in 10wt% hydrofluoric acid for 10 minutes to remove The oxide layer was washed with deionized water and dried under an inert atmosphere;
[0056] (2) Chemical deposition of Ag particles on the silicon surface: the chemical deposition solution is an aqueous solution of silver nitrate and hydrofluoric acid, the volume ratio of AgNO3:HF:H2O is 1:2:4, and the temperature is 30 o C, the time is 1min;
[0057] (3) Ag particles catalyze the corrosion of silicon materials to obtain corrosion holes: the corrosion solution is an aqueous solution of hydrofluoric acid and hydrogen peroxide, the concentration of HF is 0.3M, and the concentration of H 2 o 2 The concen...
Embodiment 2
[0064] A needle-shaped alumina carrier, comprising the steps of:
[0065] (1) Pretreatment of silicon-based materials: Cut the monocrystalline silicon wafers to a suitable size, then undergo ultrasonic cleaning with ethanol, acetone, and deionized water to remove oil stains, repeat the cleaning times twice, and then soak in 12.5wt% hydrofluoric acid Remove the oxide layer for 10 minutes, wash with deionized water, and dry under an inert atmosphere;
[0066] (2) Chemical deposition of Ag particles on the silicon surface: the chemical deposition solution is an aqueous solution of silver nitrate and hydrofluoric acid, the volume ratio of AgNO3:HF:H2O is 1:2.5:6, and the temperature is 32.5 o C, the time is 1.5min;
[0067] (3) Ag particles catalyze the corrosion of silicon materials to obtain corrosion holes: the corrosion solution is an aqueous solution of hydrofluoric acid and hydrogen peroxide, the concentration of HF is 0.35M, and the concentration of H 2 o 2 The concentra...
Embodiment 3
[0074] A needle-shaped alumina carrier, comprising the steps of:
[0075] (1) Pretreatment of silicon-based materials: Cut the monocrystalline silicon wafers to a suitable size, then undergo ultrasonic cleaning with ethanol, acetone, and deionized water to remove oil stains, repeat the cleaning times 3 times, and then soak in 15wt% hydrofluoric acid for 10 minutes Remove the oxide layer, wash with deionized water, and dry under an inert atmosphere;
[0076] (2) Chemical deposition of Ag particles on the silicon surface: the chemical deposition solution is an aqueous solution of silver nitrate and hydrofluoric acid, the volume ratio of AgNO3:HF:H2O is 1:3:8, and the temperature is 35 o C, the time is 2min;
[0077] (3) Ag particles catalyze the corrosion of silicon materials to obtain corrosion holes: the corrosion solution is an aqueous solution of hydrofluoric acid and hydrogen peroxide, the concentration of HF is 0.45M, and the concentration of H 2 o 2 The concentration i...
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Abstract
Description
Claims
Application Information
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