Phase measuring device for laser interference photoetching system and using method thereof

Abstract

The invention belongs to the technical field of optical instruments and meters, and provides a phase measuring device for a laser interference photoetching system and a using method thereof. The phasemeasuring device comprises a first wave plate, a first polarization splitting prism, a fourth wave plate, a backward reflecting mirror, a third wave plate, a reflecting mirror, a second wave plate, apolarizing film, a second polarization splitting prism, a third polarization splitting prism, a first photoelectric detector, a second photoelectric detector and a base, wherein the first polarization splitting prism, the second polarization splitting prism, the third polarization splitting prism, the first photoelectric detector and the second photoelectric detector are fixed on the base; the first wave plate, the second wave plate, the third wave plate and the fourth wave plate are respectively arranged around the first polarization splitting prism; the polarizing film and the emergent surface of the third polarization splitting prism, the backward reflecting mirror outside the fourth wave plate, and the reflecting mirror outside the third wave plate form a light path system for phase measurement. An interference measurement signal is resolved to obtain a measurement light phase, and the device and the method are used for fringe control of variable-period interference exposure.

Description

technical field [0001] The invention belongs to the technical field of optical instruments and meters, and in particular relates to a phase measurement device for a laser interference photolithography system and an application method thereof. Background technique [0002] Grating devices are key devices in major engineering systems such as large astronomical telescopes, inertial confinement fusion laser ignition systems, and photolithography systems. In recent years, the requirements for size, grid line density, and accuracy have been continuously improved. Limited to one-dimensional gratings, it also includes two-dimensional gratings, curved gratings, variable period gratings, etc. Grating manufacturing is moving towards meter-scale size, nanometer-level precision, and sub-million-level grating line density. The manufacture of large-scale gratings with diversified high-precision dense grating lines has become a hot issue in the field of grating manufacturing that needs to b...

AI Technical Summary

Problems solved by technology

[0007] In summary, the phase measurement equipment in the prior art has the following problems: the limitation of CCD resolution and frame rate makes it difficult to achieve high-speed and high-precision phase modulation; the homodyne phase measurement interferometer has poor anti-interference ability; the existing The heterodyne measurement interferometer cannot realize fringe control for the interference exposure system manufactured by variable-period gratings; that is, the phase measurement in the prior art has certain limitations, and it is impossible to realize the phase measurement of the variable-period interference exposure system and complete the variable-period interferometric exposure system. Fringe Control in Periodic Grating Process

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