Broad-spectrum photoelectric detector based on perovskite-carbon nanotube bulk heterojunction
A photodetector and carbon nanotube technology, applied in the field of wide-spectrum photodetectors, can solve the problems of wide-spectrum response exploration, photo-generated carrier recombination cannot be effectively avoided, etc., achieve high-response wide-spectrum light detection, help For efficient separation and overcoming the effect of low absorption
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Embodiment 1
[0035] Example 1: Preparation of perovskite-carbon nanotube bulk heterojunction broad-spectrum photodetector
[0036] See image 3 In this embodiment, a perovskite-carbon nanotube bulk heterojunction wide-spectrum photodetector is provided, and the main preparation steps include:
[0037] (1) Prepare N-type highly doped monocrystalline silicon wafers, clean them with standard RCA process, and dry them for later use;
[0038] (2) Transfer the cleaned monocrystalline silicon wafer to the growth equipment, and use thermal oxidation to grow a 300nm silicon dioxide gate dielectric layer;
[0039] (3) A 10nm titanium oxide interface modification layer is grown by atomic layer deposition;
[0040] (4) Weigh a certain amount of semiconducting carbon nanotube powder, purify it, and then modify the surface of the treated carbon nanotubes: weigh 100mg of the carbon nanotubes prepared and place them in a three-necked bottle And add 2.6g of 1,6-ethylenediamine in a three-necked flask, place it in a...
Embodiment 2
[0045] Example 2: Preparation of patterned perovskite-carbon nanotube bulk heterojunction broad-spectrum photodetector
[0046] See Figure 4 In this embodiment, a patterned perovskite-carbon nanotube bulk heterojunction broad-spectrum photodetector is provided, and the main preparation steps include:
[0047] (1) Prepare N-type highly doped monocrystalline silicon wafers, clean them with standard RCA process, and dry them for later use;
[0048] (2) Transfer the cleaned monocrystalline silicon wafer to a growth device, and grow a 300nm silicon dioxide gate dielectric layer by thermal oxidation;
[0049] (3) A 10nm titanium oxide interface modification layer is grown by atomic layer deposition;
[0050] (4) Configure Poly-TPD chlorobenzene precursor, with a concentration of 20mg / mL, spin-coated on the substrate at 4000 rpm, spin-coating time is 40s, and place it on a hot plate at 100°C for 10 minutes to anneal and crystallize;
[0051] (5) Define the pattern of the perovskite photosensi...
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