A kind of single crystal single domain piezoelectric thin film and preparation method thereof
A technology of piezoelectric thin film and single crystal, applied in the direction of piezoelectric/electrostrictive/magnetostrictive devices, circuits, electrical components, etc. The effect of simple process and cost reduction
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[0038] The present invention also includes a method for preparing a single crystal single domain piezoelectric film, comprising the following steps:
[0039] Preparation of composite films;
[0040] Put the composite film into an annealing furnace at 450 to 590°C for 5 to 30 minutes; or, put the composite film into the annealing furnace to heat up and anneal, and use an ion gun to spray charged ions on the surface of the composite film during the heating process to obtain a single crystal Monodomain Piezo Films.
[0041] The composite thin film of the present invention can be all existing single crystal thin films, such as lithium niobate thin film, lithium tantalate thin film, etc., and single crystal single domain thin film can be obtained by the method described in the present invention.
[0042] Preferably, the composite film is put into an annealing furnace during the heating and annealing process, and the temperature is raised to 450-590° C., and the heating rate is 2-1...
Embodiment 1
[0057] A single-crystal single-domain piezoelectric film, comprising a single-crystal film layer, a silicon dioxide layer, a dielectric layer and a single-crystal silicon layer in turn; wherein the material of the single-crystal film layer is single-crystal lithium niobate, and the ferroelectric domain is a single-domain , the piezoelectric coefficient is 98% to 100% of the bulk material; the dielectric layer is the damaged layer of single crystal silicon.
[0058] The single crystal lithium niobate in the material of the single crystal thin film layer can be replaced by single crystal lithium tantalate; the damaged layer of single crystal silicon in the dielectric layer can be replaced by amorphous silicon or polycrystalline silicon.
Embodiment 2
[0060] A single-crystal single-domain piezoelectric film, comprising a single-crystal film layer, a silicon dioxide layer, a dielectric layer and a single-crystal silicon layer in turn; wherein the material of the single-crystal film layer is single-crystal lithium niobate, and the ferroelectric domain is a single-domain , the piezoelectric coefficient is 98% to 100% of the bulk material; the dielectric layer is the damaged layer of single crystal silicon.
[0061] The thickness of the single crystal thin film layer is 100 nm, the thickness of the silicon dioxide layer is 100 nm; the thickness of the dielectric layer is 100 nm, and the thickness of the single crystal silicon is 200 μm.
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