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Green, cheap and environment-friendly chemical mechanical polishing method for optical quartz glass

A technology of quartz glass and chemical machinery, applied in the direction of grinding machine tools, grinding devices, metal processing equipment, etc., can solve the problems of reducing product reliability, increasing production costs, increasing cleaning costs, etc., and achieves low flow rate and low concentration of components , the effect of short polishing time

Inactive Publication Date: 2019-12-03
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Strong acids, strong alkalis and toxic reagents pose serious hazards to the environment and the health of operators and do not conform to the modern green processing concept; metal ions in the polishing solution easily remain on the substrate surface, reducing product reliability and increasing The cost of cleaning after chemical mechanical polishing; the use of high concentrations and various reagents will also increase production costs, which does not conform to the principle of economical processing

Method used

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  • Green, cheap and environment-friendly chemical mechanical polishing method for optical quartz glass
  • Green, cheap and environment-friendly chemical mechanical polishing method for optical quartz glass
  • Green, cheap and environment-friendly chemical mechanical polishing method for optical quartz glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] The main components and contents of the polishing liquid: the content of cerium oxide abrasive grains is 2%, the content of D-sorbitol is 0.5%, and the pH is adjusted to 5.4 with citric acid;

[0040] Process parameters: polishing pressure is 40.6kPa, polishing disc rotation speed is 80rpm;

[0041] The polished quartz glass surface roughness Ra value is 0.696nm, rms value is 0.874nm, PV value is 7.772nm (see figure 1 ).

Embodiment 2

[0043] The main components and contents of the polishing liquid: the content of cerium oxide is 1%, the content of D-sorbitol is 0.5%, and the pH is adjusted to 4.3 by using citric acid;

[0044] Process parameters: polishing pressure is 44.2kPa, polishing disc rotation speed is 80rpm;

[0045] The polished quartz glass surface roughness Ra value is 0.742nm, rms value is 0.936nm, PV value is 8.355nm (see figure 2 ).

Embodiment 3

[0047] The main components and contents of the polishing liquid: the content of cerium oxide is 2%, the content of D-sorbitol is 1%, and the pH is adjusted to 5.3 by using citric acid;

[0048] Process parameters: polishing pressure is 38.0kPa, polishing disc rotation speed is 80rpm;

[0049] The polished quartz glass surface roughness Ra value is 0.659nm, rms value is 0.831nm, PV value is 7.900nm (see image 3 ).

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Abstract

The invention provides a green, cheap and environment-friendly chemical mechanical polishing method for optical quartz glass, and belongs to the field of ultra-precision machining of hard and brittlematerials. Firstly, quartz glass is ground, and then chemical mechanical rough polishing and fine polishing are conducted in sequence. During rough polishing, polishing liquid is composed of alpha-aluminum oxide abrasive materials with the average particle size ranging from 30 nm to 100 nm and deionized water, and a polyurethane pad is selected as the polishing pad. During fine polishing, the polishing solution is composed of a ceramic abrasive material, a dispersing agent, a pH regulator and deionized water. The average particle size of the ceramic grinding material is 20-50nm, and the weightpercentage of the ceramic grinding material is 1-3%; the weight percentage of the dispersing agent is 0.1-2%; the pH regulator is citric acid, acetic acid and malic acid, and the pH value is regulated to 4-6. The polishing pad is a frosted leather pad. After polishing, the surface roughness Ra of the quartz glass reaches 0.6-0.75 nm, and efficient ultra-low-damage ultra-precision chemical mechanical polishing of the quartz glass is achieved.

Description

technical field [0001] The invention belongs to the field of ultra-precision processing of hard and brittle materials, and in particular relates to an economical and environment-friendly chemical mechanical polishing method for optical quartz glass. Background technique [0002] Optical quartz glass has excellent light transmission properties in multi-spectral regions, and has the advantages of high temperature resistance, extremely small thermal expansion coefficient, stable chemical properties, and radiation resistance. It is a commonly used optical and substrate material for optical precision devices, and is widely used in aviation. Aerospace, detection systems, spectroscopic instruments and optical communications and other fields. [0003] Modern optical systems have increasingly stringent requirements on the surface roughness of optical components, which have reached the sub-nanometer level. For example, laser gyro mirrors and high-energy laser mirrors all require surfa...

Claims

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Application Information

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IPC IPC(8): B24B1/00B24B37/04
CPCB24B1/00B24B37/042B24B37/044
Inventor 张振宇谢文祥杜岳峰刘冬冬
Owner DALIAN UNIV OF TECH
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