Tungsten trioxide gas-sensitive film material, tungsten trioxide-based composite gas-sensitive film material, and preparation methods and applications of tungsten trioxide gas-sensitive film material and tungsten trioxide-based composite gas-sensitive film material
A technology of tungsten trioxide and gas-sensitive film, which is applied in the direction of analyzing materials, material resistance, and material analysis through electromagnetic means, can solve the problems of reducing the effective contact area of gas, avoid nanostructure damage, and improve gas-sensitive response Effect
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Embodiment 1
[0031] Embodiment 1: Preparation of nanostructure WO by chemical bath method 3 film
[0032] (1) Dissolve a certain amount of sodium tungstate and citric acid in deionized water according to the mass ratio of 1:2;
[0033] (2) Stir the above solution at room temperature for 0.5 hours, then add 6 mL of dilute hydrochloric acid solution with a concentration of 3 mol / L, and continue stirring at room temperature for 0.5 hours to obtain a clear precursor solution;
[0034] (3) Immerse the cleaned ceramic substrate printed with electrodes into WO 3 Precursor solution, and place it in a water bath at 60°C for 2 hours;
[0035] (4) After the heat preservation is completed, the ceramic substrate is taken out, cleaned and dried, and heat-treated at 400° C. for 10 hours.
[0036] The nanostructure WO prepared in embodiment 1 3 The scanning electron microscope image of the thin film is shown in figure 1 As shown, the prepared nano-WO 3 The film is composed of nanosheets with a thick...
Embodiment 2
[0037] Embodiment 2: Preparation of nanostructure WO by chemical bath method 3 film
[0038] (1) Weigh a certain amount of sodium tungstate and ammonium oxalate and dissolve them in deionized water according to the mass ratio of 5:1;
[0039] (2) Stir the above solution at room temperature for 0.5 hours, then add 10 mL of dilute hydrochloric acid solution with a concentration of 3 mol / L, and continue stirring at room temperature for 0.5 hours to obtain a clear precursor solution;
[0040] (3) Immerse the cleaned ceramic substrate printed with electrodes into WO 3 Precursor solution, and place it in a hydrothermal reaction kettle at 120°C for 2 hours;
[0041] (4) After the heat preservation is completed, the ceramic substrate is taken out, washed and dried, and heat-treated at 350° C. for 20 hours.
[0042] like figure 2 As shown, the prepared nano-WO 3 The film is composed of nano-sheets with a thickness of about 100-200nm, and the nano-sheets grow vertically to form a ...
Embodiment 3
[0043] Embodiment 3: Preparation of nanostructure WO by chemical bath method 3 film
[0044] (1) Weigh a certain amount of sodium tungstate, ammonium oxalate, and ammonium sulfate according to the mass ratio of 6:4:1 and dissolve them in deionized water;
[0045] (2) Stir the above solution at room temperature for 0.5 hours, then add 8 mL of dilute hydrochloric acid solution with a concentration of 3 mol / L, and continue stirring at room temperature for 0.5 hours to obtain a clear precursor solution;
[0046] (3) Immerse the cleaned ceramic substrate printed with electrodes into WO 3 precursor solution, and place it in a water bath at 80°C for 0.5 hours;
[0047] (4) After the heat preservation is completed, the ceramic substrate is taken out, washed and dried, and heat-treated at 300° C. for 48 hours.
[0048] like image 3 As shown, the prepared nano-WO 3 The film is composed of nano-sheets with a thickness of about 50-100nm, and the nano-sheets grow vertically to form a...
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