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High-anisotropy rare earth hard magnetic nano-particles and preparation method thereof

An anisotropic, nanoparticle technology, applied in the field of rare earth hard magnetic nanometers, can solve the problems of runaway, rapid growth, and uncontrollable size of alloy nanoparticles, and achieve ordered crystallization temperature reduction, controllable size, and composition. tuning effect

Inactive Publication Date: 2019-10-22
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, annealing after high temperature deposition usually leads to uncontrolled and rapid growth of alloy nanoparticles, making the size uncontrollable. It is a desirable method to reduce the ordered crystallization temperature by element doping

Method used

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  • High-anisotropy rare earth hard magnetic nano-particles and preparation method thereof
  • High-anisotropy rare earth hard magnetic nano-particles and preparation method thereof
  • High-anisotropy rare earth hard magnetic nano-particles and preparation method thereof

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preparation example Construction

[0028] One aspect of the embodiments of the present invention provides a method for preparing highly anisotropic rare earth hard magnetic nanoparticles, which includes:

[0029] Provide Sm(Co 1-x Ni x ) y Target and / or Sm(Co 1-x Cu x ) y Target material, wherein x is 0.2 to 0.8, and y is 2 to 10;

[0030] The Sm(Co 1-x Ni x ) y Target and / or Sm(Co 1-x Cu x ) y The target material is placed in a nano-cluster deposition system for nano-cluster deposition to obtain highly anisotropic rare earth hard magnetic nanoparticles.

[0031] As one of the preferred schemes, the conditions for the deposition of nanoclusters include: the pressure of the deposition chamber is below 1000 Pa, the flow rate of the working gas is below 1000 sccm, the flow rate of the transmission medium is below 1600 sccm, and the flight heating temperature is from room temperature to 1000 ° C. The distance between the cluster source and the substrate is less than 100cm, the power is less than 100W, a...

Embodiment 1

[0062] SmCo 5 , Sm(Co 0.7 Ni 0.3 ) 5 and Sm(Co 0.7 Cu 0.3 ) 5 Weigh high-purity Sm, high-purity Co, high-purity Ni and high-purity Cu corresponding to the mass, mix the corresponding proportion of elements, and then use the same method to prepare three kinds of targets respectively.

[0063] SmCo 5 , Sm(Co 0.7 Ni 0.3 ) 5 and Sm(Co 0.7 Cu 0.3 ) 5 Put the target material into the cluster source position of the equipment, put the substrate / micro-grid carbon film into the deposition chamber, and pump until the vacuum of the deposition chamber reaches 1.5*10 -8 Below mbar, turn on the circulating water, adjust the position of the cluster source to 100mm, set the flow rate of Ar gas and He gas to 98sccm and 30sccm respectively, and the pressure of the deposition chamber to 110Pa, use 0.2A, 0.3A and 0.2A sputtering respectively current and a sputtering voltage of 160V to deposit SmCo 5 , Sm(Co 0.7 Ni 0.3 ) 5 and Sm(Co 0.7 Cu 0.3 ) 5 Nanoparticles, and according to...

Embodiment 2

[0067] SmCo 5 , Sm(Co 0.7 Cu 0.3 ) 5 and Sm(Co 0.7 Ni 0.3 ) 5 Weigh high-purity Sm, high-purity Co, high-purity Ni and high-purity Cu corresponding to the mass, mix the corresponding proportion of elements, and then use the same method to prepare three kinds of targets respectively.

[0068] SmCo 5 , Sm(Co 0.7 Ni 0.3 ) 5 and Sm(Co 0.7 Cu 0.3 ) 5 Put the target material into the cluster source position of the equipment, put the substrate / micro-grid carbon film into the deposition chamber, and pump until the vacuum of the deposition chamber reaches 1.5*10 -8 Below mbar, turn on the circulating water, adjust the position of the cluster source to 100cm, set the flow rates of Ar gas and He gas to 98sccm and 30sccm respectively, set the pressure of the deposition chamber to 110Pa, set the flight heating temperature to 750-820°C, and use 0.2A, 0.3A and 0.2A sputtering current and 160V sputtering voltage deposit SmCo 5 , Sm(Co 0.7 Ni 0.3 ) 5 and Sm(Co 0.7 Cu 0.3 ) 5 ...

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Abstract

The invention discloses high-anisotropy rare earth hard magnetic nano-particles and a preparation method thereof. The preparation method comprises the following steps of: providing an Sm(Co1-xNix)y target and / or Sm(Co1-xCux)y target, wherein x is 0.2-0.8, and y is 2-10; and putting the Sm(Co1-xNix)y target and / or Sm(Co1-xCux)y target in a nanocluster deposition system for nanocluster deposition toobtain the high-anisotropy rare earth hard magnetic nano-particles. The ordered crystallization temperature of the rare earth hard magnetic nano-particles prepared by the method is greatly reduced; and the magnetic properties of the high-anisotropy rare earth hard magnetic nano-particles are significantly improved. The method is conductive to the size controllable preparation of the rare earth hard magnetic nano-particles and the obtaining of relatively small-sized crystalline particles and is of great significance for the application of the high-anisotropy rare earth hard magnetic nano-particles and the development of ultra-high-density magnetic recording new materials.

Description

technical field [0001] The invention relates to the field of rare earth hard magnetic nanometer technology, in particular to a highly anisotropic rare earth hard magnetic nano particle and a preparation method thereof. Background technique [0002] Rare earth hard magnetic nanoparticles are alloy nanoparticles composed of rare earth elements and transition metal elements, with a scale ranging from a few angstroms to hundreds of angstroms. They are considered to be a new material level between atoms and bulk materials, and belong to the frontier Research areas. In recent years, some new properties of alloy nanoparticles have been found, such as insoluble (solid solution) alloys under the bulk become solid solution (non-solid solution) nanoparticles, and the disorder-order phase transition temperature decreases with decreasing size. The discovery of these new phenomena and properties has promoted the application of alloy nanoparticles in important fields such as ultra-high-de...

Claims

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Application Information

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IPC IPC(8): C23C14/16C23C14/20C23C14/34H01F41/18H01F41/30B82Y40/00
CPCC23C14/165C23C14/205C23C14/34H01F41/301H01F41/18B82Y40/00
Inventor 李云那迪姆丁健中刘平刘友好夏卫星张健
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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