Single-crystal tin selenide pyroelectric thin film and preparing method thereof
A technology of thermoelectric thin film and tin selenide, applied in chemical instruments and methods, single crystal growth, single crystal growth, etc., can solve the problems of inapplicability to large-scale process production and application, complex preparation process, and low performance, and achieve parameters Easy control and optimization, simple preparation method, high power factor effect
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Embodiment 1
[0042] This embodiment provides a method for preparing a single crystal tin selenide thermoelectric thin film, comprising the following steps:
[0043] S1. Take an ordinary glass substrate, place it in a mixture of absolute ethanol and deionized water, and ultrasonically clean it for 10 minutes at room temperature to remove oil and impurities on the surface of the ordinary glass substrate. After cleaning, take out the ordinary glass substrate and place it on the In the oven, heat up the oven to 120°C, dry at atmospheric pressure for 2 hours, take it out and cool to room temperature naturally;
[0044] S2. Put the ordinary glass substrate processed in step S1 on the sample stage of the spin coater, and before adding the graphene oxide dispersion, shake the container containing the graphene oxide dispersion to make it uniform, and then Add 0.3mL of graphene oxide dispersion with a concentration of 5mg / mL dropwise to the surface of the common glass substrate, so that the graphene...
Embodiment 2
[0048] This embodiment provides a method for preparing a single crystal tin selenide thermoelectric thin film, comprising the following steps:
[0049] S1. Take an ordinary glass substrate, place it in a mixture of absolute ethanol and deionized water, and ultrasonically clean it for 10 minutes at room temperature to remove oil and impurities on the surface of the ordinary glass substrate. After cleaning, take out the ordinary glass substrate and place it on the In the oven, heat up the oven to 120°C, dry at atmospheric pressure for 2 hours, take it out and cool to room temperature naturally;
[0050]S2. Put the ordinary glass substrate processed in step S1 on the sample stage of the spin coater, and before adding the graphene oxide dispersion, shake the container containing the graphene oxide dispersion to make it uniform, and then Add 0.3mL of graphene oxide dispersion with a concentration of 5mg / mL dropwise to the surface of the common glass substrate, so that the graphene ...
Embodiment 3
[0054] This embodiment provides a method for preparing a single crystal tin selenide thermoelectric thin film, comprising the following steps:
[0055] S1. Take the mica substrate, place it in a mixture of absolute ethanol and deionized water, and ultrasonically clean it for 10 minutes at room temperature to remove oil and impurities on the surface of the mica substrate. After cleaning, take out the mica substrate and place it in an oven. Heat up the oven to 150°C, dry at atmospheric pressure for 2 hours, take it out and let it cool down to room temperature naturally;
[0056] S2, put the treated mica substrate in step S1 on the sample stage of the spin coater, before adding the graphene oxide dispersion, first shake the container with the graphene oxide dispersion to make it uniform, and then Add 0.5mL of graphene oxide dispersion with a concentration of 3mg / mL dropwise on the surface of the mica substrate, so that the graphene oxide dispersion completely covers the upper sur...
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