Supported high-porosity porous metal oxide material, and preparation method and application thereof
A porous metal, high porosity technology, applied in the directions of tin oxide, zinc oxide/zinc hydroxide, cobalt oxide/cobalt hydroxide, etc., which can solve the problem of expensive raw material yield of chemical vapor deposition method, unsuitable for large-scale production, and reaction conditions Harsh and other problems, to achieve the effect of increasing the amount of electron transport, conducive to diffusion transport, and easy availability of raw materials
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Embodiment 1
[0026] Dissolve 2.0g methyl orthosilicate in a mixed solution of 5.0mL ethanol and 5.0mL methanol, stir for 6h to obtain solution A; dissolve 4.2g ZnCl 2 Dissolve in 15.0mL of water, add 0.08g of chloroauric acid, stir until completely dissolved to obtain solution B; mix solution A and solution B, stir for 1 hour, heat to 100°C to completely volatilize the solution to obtain a solid; place the obtained solid in Roast in a muffle furnace at a temperature of 450°C and a time of 1.5 hours. Disperse the obtained solid in a solution with pH=10, react at 50°C for 4h to etch SiO 2 ; The etched sample was centrifuged, washed 3 times with distilled water, and dried at 100°C to obtain Au-loaded porous ZnO material with a specific surface area of 85m 2 / g, the material has 2-500nm hierarchical micropores, mesopores and macropores.
Embodiment 2
[0028] Dissolve 1.15g (3-aminopropyl)triethoxysilanetrimethoxysilane in 8.0mL tetrahydrofuran and stir for 1h to obtain solution A; dissolve 6.6g Na 2 [Sn(OH) 6] was dissolved in 20mL of ethanol, added 0.1g of platinum particles, stirred until completely dissolved to obtain solution B; mixed solution A and solution B, stirred for 3.5 hours, and spread the solution on multiple petri dishes to make the solution completely volatilize, A solid was obtained; the obtained solid was roasted in a tube furnace under a nitrogen atmosphere at a roasting temperature of 500° C. for a roasting time of 3 h. Disperse the obtained solid in a solution with pH=10, react at 80°C for 2h to etch SiO 2 ; The etched sample was centrifuged, washed 3 times with distilled water, and dried at 100°C to obtain Pt-loaded porous SnO 2 Material, specific surface area 76m 2 / g, the material has 10-200nm hierarchical micropores, mesopores and macropores.
Embodiment 3
[0030] Dissolve 2.25g of sodium silicate in 9.0mL of water and stir for 2 hours to obtain solution A; dissolve 3.8g of cobalt acetylacetonate in 12.0mL of methanol and stir until completely dissolved to obtain solution B; mix solution A and solution B and stir for 5 hour, the above solution was applied to the quartz substrate by spin coating method, and the solution was completely volatilized to obtain a solid; the obtained solid was roasted in a muffle furnace at a roasting temperature of 300 °C for a roasting time of 2.5 hours; and then the obtained solid Disperse in a solution with pH = 13, react at room temperature for 12 hours to etch SiO 2 ; The etched sample was separated after natural sedimentation, washed 3 times with ethanol, and dried at 100°C to obtain porous Co 3 o 4 Material, specific surface area 185m 2 / g, the material has multi-level micropores and mesopores of 0.5-60nm.
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