Image-text protection structure based on dynamic anti-counterfeiting film and preparation method thereof
A technology of protective structure and graphics, which is applied in the field of graphic protection structure based on dynamic anti-counterfeiting film and its preparation, can solve the problems of easy abrasion of graphics and text, monotonous display mode, and decreased clarity, so as to achieve simple display and enhanced vision Feel and choose from a wide range of effects
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Embodiment 1
[0057] figure 1 This embodiment is based on the graphic protection structure of the dynamic anti-counterfeiting film. The structure from top to bottom is: micro lens array layer 1, graphic layer 2, transparent organic film layer 3, micro pattern array layer 4, and reflective layer 5 plated on the surface of the micro pattern array.
[0058] In this embodiment, the microlens array is arranged in a square shape, the period p of the microlens array is 50 μm, the aperture of a single microlens is also 50 μm, the lens height is 15 μm, and the focal length is 56 μm.
[0059] The unit pattern of the micropattern array in this embodiment is the letter "A" 21, such as figure 2 As shown, the micro-pattern array layer is arranged in a square, and its period t is different from the period p of the micro-lens array, here is 50.5 μm, and the micro-pattern array period t is 1.01 times that of the micro-lens array p. The period T of the micro-pattern array after being enlarged by the lens can be ...
Embodiment 2
[0079] Embodiment 1 is to deposit the reflective layer on the micro-pattern array. Another method is to mold the micro-pattern array layer on the reflective layer. The molding process is to deposit the reflective layer on the organic thin film layer, and then mold the micro-pattern on the reflective layer. Array.
[0080] The manufacturing process of the graphic protection structure based on the dynamic anti-counterfeiting film in this embodiment is as follows:
[0081] 1. Take a PET film 81 with a length of 10m, a film thickness of 50μm, and a width of 20cm, and use a silk screen embossing method on one of its surfaces to make a graphic "LOGO", such as Figure 7 .
[0082] 2. The photoresist template for the microlens array and the micropattern array is prepared, and the specific process is the same as in Example 1;
[0083] 3. Preparation of the micro lens array and the nickel plate of the micro pattern array, the specific process is the same as in Example 1;
[0084] 4. Take another...
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