Preparation method and product of nuclear zirconium alloy surface crn coating
A zirconium alloy and coating technology is applied in the field of preparation technology of high-thickness CrN coating, which can solve the problems of poor bonding force between coating and zirconium alloy, poor corrosion resistance, etc. simple effect
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Embodiment 1
[0030] In this embodiment, the CrN coating deposited on the surface of the Zr-4 alloy substrate adopts ultra-high vacuum multi-target co-sputtering technology. 2 The purity is 99.999%, and the specific preparation process includes the following steps:
[0031] (1) Base material pretreatment
[0032] Process the Zr-4 alloy into a square piece with a side length of 1cm and a thickness of 3mm, and use 240 mesh, 600 mesh, 1000 mesh, 1500 mesh, and 3000 mesh water abrasive paper to polish the Zr-4 alloy substrate in turn from coarse to fine, and then use The polishing paste was polished on a metallographic polishing machine. After polishing, it was ultrasonically cleaned with acetone and absolute ethanol for 10 minutes, and dried for use.
[0033] (2) Reverse sputtering cleaning of substrate material
[0034] Place the pretreated substrate material on the sample stage in the vacuum furnace cavity of the magnetron sputtering equipment, and vacuum the vacuum furnace cavity to 2×10 ...
Embodiment 2
[0042] In this embodiment, the CrN coating deposited on the surface of the Zr-4 alloy substrate adopts ultra-high vacuum multi-target co-sputtering technology. 2 The purity is 99.999%, and the specific preparation process includes the following steps:
[0043] (1) Base material pretreatment
[0044] Process the Zr-4 alloy into a square piece with a side length of 1cm and a thickness of 3mm, and use 240 mesh, 600 mesh, 1000 mesh, 1500 mesh, and 3000 mesh water abrasive paper to polish the Zr-4 alloy substrate in turn from coarse to fine, and then use The polishing paste was polished on a metallographic polishing machine. After polishing, it was ultrasonically cleaned with acetone and absolute ethanol for 15 minutes, and dried for use.
[0045] (2) Reverse sputtering cleaning of substrate materials
[0046] Place the pretreated substrate material on the sample stage in the vacuum furnace cavity of the magnetron sputtering equipment, and vacuum the vacuum furnace cavity to 1×10...
Embodiment 3
[0054] In this embodiment, the CrN coating deposited on the surface of the Zr-4 alloy substrate adopts ultra-high vacuum multi-target co-sputtering technology. 2 The purity is 99.999%, and the specific preparation process includes the following steps:
[0055] (1) Base material pretreatment
[0056] Process the Zr-4 alloy into a square piece with a side length of 1cm and a thickness of 3mm, and use 240 mesh, 600 mesh, 1000 mesh, 1500 mesh, and 3000 mesh water abrasive paper to polish the Zr-4 alloy substrate in turn from coarse to fine, and then use The polishing paste was polished on a metallographic polishing machine. After polishing, it was ultrasonically cleaned with acetone and absolute ethanol for 20 minutes, and dried for use.
[0057] (2) Reverse sputtering cleaning of substrate materials
[0058] Place the pretreated substrate material on the sample stage in the vacuum furnace cavity of the magnetron sputtering equipment, and vacuum the vacuum furnace cavity to 2×10...
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