Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method and device for increasing the amount of volatile impurities removed during electron beam smelting

An electron beam smelting and volatile technology, which is applied in chemical instruments and methods, inorganic chemistry, silicon compounds, etc., can solve the problems of long smelting time and high cost of impurity removal, shorten the time of smelting and impurity removal, increase the evaporation surface area, reduce cost effect

Active Publication Date: 2020-11-06
DALIAN UNIV OF TECH
View PDF17 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Electron beam smelting technology can provide a high temperature and high vacuum environment. Impurities tend to volatilize from the surface of silicon melt in the form of gas and form a gas / liquid equilibrium state with liquid phase, which is conducive to the removal of volatile impurities, but the melting time Longer, higher cleaning costs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method and device for increasing the amount of volatile impurities removed during electron beam smelting
  • A method and device for increasing the amount of volatile impurities removed during electron beam smelting
  • A method and device for increasing the amount of volatile impurities removed during electron beam smelting

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0046] Such as Figure 1-Figure 3 As shown, a device for increasing the amount of volatile impurities removed during electron beam smelting, including:

[0047] The first type of electron gun and the second type of electron gun are used to melt and smelt the silicon material and keep the silicon material in a liquid state, wherein the first ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method and device for increasing the impurity removal amount of volatile impurities in an electron beam smelting process. According to the invention, in an electron beam smelting process, the surface of a silicon melt can be fluctuated by changing the melting mode of an electron beam, so that the evaporation surface area is increased, the evaporation surface area of a melt interface is increased, and the evaporation amount of impurities in unit time is increased; a graphite substrate is placed at the bottom of a smelting crucible, and then the temperature distributionat the bottom of the silicon melt is changed, so that flowing of the silicon melt at the bottom of the smelting crucible is promoted, convection occurs in the silicon melt, and then melt exchange between the silicon melt at the bottom and the silicon melt at the top is accelerated. Through the change of the melting mode and the experimental device of the electron beam, the evaporation surface area of the melt is increased, the evaporation amount of the impurities in unit time is increased, and therefore, the problems that a silicon melt is low in impurity evaporation amount, long in melting time, large in silicon material loss and high in cost in an impurity removal process of volatile impurities are solved.

Description

technical field [0001] The invention relates to the field of smelting and impurity removal, in particular to a method and device for increasing the amount of volatile impurities removed during electron beam smelting. Background technique [0002] Volatile impurity elements such as phosphorus, aluminum, calcium, arsenic, etc. are very common impurity elements in silicon materials. The content of impurity elements in solar-grade silicon will affect the photoelectric conversion efficiency of silicon panels. By doping trace elements in high-purity silicon It can increase the concentration of carriers, facilitate the migration and diffusion of electrons, and then improve the photoelectric performance of solar-grade silicon. Therefore, how to obtain high-purity solar-grade silicon is a research hotspot in current scientific research. In the process of purifying metallurgical-grade silicon to prepare solar-grade silicon materials by metallurgical methods, the equilibrium segregatio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/037
Inventor 姜大川王唯一李鹏廷石爽
Owner DALIAN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products