Preparation method of polymer carbon film for anti-wear and anti-friction surface modification of fluororubber, and fluororubber obtained by using carbon film
A fluorine rubber, modified technology, applied in the field of fluorine rubber, can solve problems such as lackluster methods, achieve low friction coefficient, good wear resistance, and avoid heat damage
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0037] Fluorine rubber is used as the base material (thickness is 2mm), and the distance between the target and the base material is 9cm;
[0038] When the vacuum degree is higher than 2×10 -4 Pa, pass argon (Ar) in the deposition chamber, apply a DC bias voltage of 1000V to the substrate to generate Ar ions, and clean the substrate by sputtering for about 10 minutes;
[0039] CH 3 F, CH 4 Mix it with Ar in a ratio of 1:2:4 and pass it into the reaction chamber, and turn on the intermediate frequency DC sputtering power supply under the condition of 3.0Pa;
[0040] Control the sputtering power density of the target to 6W / cm 2 , and at the same time, under the action of self-bias, the charged ions are generated to bombard and sputter the high-purity graphite target to generate mixed plasma;
[0041]While sputtering the target, turn on the intermediate frequency pulsed DC bias power supply, control the voltage to 200V, and accelerate the mixed plasma generated above to reach...
Embodiment 2
[0045] Fluorine rubber is used as the base material (thickness is 2mm), and the distance between the target and the base material is 9cm;
[0046] When the vacuum degree is higher than 2×10 -4 Pa, pass argon (Ar) in the deposition chamber, apply a DC bias voltage of 1000V to the substrate to generate Ar ions, and clean the substrate by sputtering for about 10 minutes;
[0047] CH 3 F, CH 4 Mix with Ar in a ratio of 1:2:3 and pass it into the reaction chamber, and turn on the intermediate frequency DC sputtering power supply under the working pressure of 3.0Pa;
[0048] Control the sputtering power density of the target to 6W / cm 2 , and at the same time, under the action of self-bias, the charged ions are generated to bombard and sputter the high-purity graphite target to generate mixed plasma;
[0049] While sputtering the target, turn on the intermediate frequency pulsed DC bias power supply, control the voltage to 200V, accelerate the mixed plasma generated above to reac...
Embodiment 3
[0052] Fluorine rubber is used as the base material (thickness is 2mm), and the distance between the target and the base material is 9cm;
[0053] When the vacuum degree is higher than 2×10 -4 Pa, pass argon (Ar) in the deposition chamber, apply a DC bias voltage of 1000V to the substrate to generate Ar ions, and clean the substrate by sputtering for about 10 minutes;
[0054] CH 3 F, CH 4 Mix with Ar in a ratio of 1:2:5 and pass it into the reaction chamber, and turn on the intermediate frequency DC sputtering power supply under the condition of 3.0Pa;
[0055] Control the sputtering power density of the target to 6W / cm 2 , and at the same time, under the action of self-bias, the charged ions are generated to bombard and sputter the high-purity graphite target to generate mixed plasma;
[0056] While sputtering the target, turn on the intermediate frequency pulsed DC bias power supply, control the voltage to 200V, accelerate the mixed plasma generated above to reach the s...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com