Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

A double-grid controlled cold cathode electron gun and a preparation method thereof

A double gate control, electron gun technology, applied in cold cathodes, discharge tube electron guns, electron/ion guns of transit time electron tubes, etc. life and other issues, to achieve the effect of weakening the electrostatic shielding effect, avoiding processing burrs, and achieving good consistency

Active Publication Date: 2018-12-21
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF11 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cathode surface cannot avoid edge burrs during process processing. According to the field emission characteristics, this disadvantage will lead to edge effects. Therefore, the electric field distribution on the cathode surface of these two electron guns is uneven, resulting in uneven emission current density and sparking on the edge burrs. Phenomenon, affecting the service life of the cathode
[0007] Therefore, these three cold cathode electron source arrays are not suitable for electric vacuum radiation source devices or devices requiring large currents

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A double-grid controlled cold cathode electron gun and a preparation method thereof
  • A double-grid controlled cold cathode electron gun and a preparation method thereof
  • A double-grid controlled cold cathode electron gun and a preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] Such as Figure 1~6 As shown, the double grid controlled cold cathode electron gun provided in this embodiment includes an electron gun insulating shell, an annular electrode piece 2, a cathode base 3, a cathode substrate 4, a tubular insulating connector 5, a cathode grid 6, an outer Set the grid 7 and the tube-type focusing pole 8, wherein the inside of the electron gun insulating shell is vacuum and is composed of a lower sleeve 101 and an upper sleeve 102, and the annular electrode sheet 2 is arranged on the lower sleeve 101 Between the upper sleeve 102, the cathode base 3 has a two-stage stepped column structure and seals the lower port of the lower sleeve 101, and the cathode substrate 4 has a column structure and has a The cold cathode material layer 401, the inner cavity of the tubular insulating connecting body 5 has a two-stage stepped columnar structure.

[0050] Such as Figure 1~3 As shown, in the structure of the double grid control type cold cathode ele...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of vacuum electronic devices, and discloses a double-grid control type cold cathode electron gun and a preparation method thereof. In accordance with the present invention, A simple, a new type of electron gun with long service life and excellent performance is provided, the cold cathode is used as the emission source of the vacuum electronic device, Asurface of the cold cathode is arrayed by a cathode grid, which can effectively weaken the electrostatic shielding effect of electron emitted by large area cold cathode material, the emission currentof large area cold cathode material is increased, At the same time, the surface of the cathode substrate is designed as a whole plane so as to not only avoid machining burr and other problems, improveedge effect and spark phenomenon, but also make the electric field distribution on the surface of cathode substrate flat, which is conducive to improving the uniformity of emission current density and achieving the purpose of large current emission, so the electron gun can be used in vacuum electron radiation components or devices that generate large current and high density electron beam.

Description

technical field [0001] The invention belongs to the technical field of vacuum electronic devices, and specifically relates to a double-gate control type cold cathode electron gun and a preparation method thereof, which can be applied to vacuum electron radiation components or devices that generate large current and high-density electron injection. Background technique [0002] Field electron emission is a form of electron emission that is completely different in nature from thermionic emission. Thermionic emission is based on raising the temperature of the object, giving additional energy to the electrons inside the object, so that some high-energy electrons can escape over the potential barrier on the surface of the object. The current density that thermionic emission can provide is no more than a few hundred A / cm 2 , and there is still a period of hysteresis; but even if the metal is heated to a high temperature where significant evaporation occurs, the number of electron...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J23/06H01J3/02H01J19/24
CPCH01J3/021H01J19/24H01J23/06
Inventor 袁学松陈青云鄢扬王彬李海龙蒙林
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products