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A technology of polishing liquid and solution, which is applied in the field of polishing and can solve problems such as unsatisfactory
Active Publication Date: 2019-09-17
湖南庄耀光电科技有限公司
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The traditional polishing solution is to directly prepare and use cerium oxide and distilled water at a ratio of 1:2, and its pH value is usually between 6.8 and 9, which can only be applied to the processing requirements of quartz glass with general surface shape and medium surface defect level , cannot meet the processing requirements of ultra-precision polished quartz glass (surface shape accuracy is better than 0.1nm, surface shape defect level is zero)
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[0021] A method for preparing a polishing liquid in an embodiment includes the following steps S110-S140:
[0022] S110, providing the following raw materials: 4.5-5 parts by weight of zinc salt, 100 parts by weight of water and 20-35 parts by weight of cerium oxide.
[0023] Wherein, the zinc salt is selected from at least one of zinc nitrate, zinc sulfate and zinc chloride.
[0024] In this embodiment, the zinc salt is zinc nitrate.
[0025] Further, the particle diameter of cerium oxide is 200 mesh to 500 mesh.
[0026] In this embodiment, the particle size of cerium oxide is 200 mesh, 300 mesh, 400 mesh or 500 mesh.
[0027] By reasonably setting the ratio of zinc salt, water and cerium oxide, a polishing solution with a pH value of 5.5-6 can be obtained, and the pH value of the polishing solution is controlled at 5.5-6. The mechanical and chemical effects of the polishing solution on quartz glass can reach An equivalent state, at this time, the uniformity of chemical a...
Embodiment 1
[0037] Add 5 parts of zinc nitrate to 100 parts of water, and heat to 141°C while stirring until the zinc nitrate is completely dissolved to obtain a zinc nitrate solution. The zinc nitrate solution was left to stand for more than 4 hours, heated to 30°C, and filtered five times, and the pH value of the filtrate was tested to be about 5.1.
[0038] Add the filtrate to 35 parts of cerium oxide, stir once every 3 hours, repeat four times, and test its pH value to be about 6 after standing still.
Embodiment 2
[0040] Add 4.5 parts of zinc sulfate to 100 parts of water, and heat to 131°C while stirring until the zinc sulfate is completely dissolved to obtain a zinc sulfate solution. The zinc sulfate solution was left to stand for more than 4 hours, heated to 25°C, and filtered three times, and the pH value of the filtrate was tested to be about 5.1.
[0041] Add the filtrate to 20 parts of cerium oxide, stir once every 1 hour, repeat three times, and test its pH value to be about 5.6 after standing still.
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Abstract
The invention relates to a preparation method of a polishing solution. The method comprises the following steps: adding 4.5-5 parts by weight of a zinc salt into 100 weight parts of water, heating anddissolving at a temperature of 131-141 DEG C to obtain a zinc-containing solution; standing the zinc-containing solution for 4 hours or longer, heating to the temperature of 25-30 DEG C, and repeatedly filtering to obtain the filtrate; adding the filtrate into 20-35 parts of weight of cerium oxide, intermittently stirring for multiple times, thereby obtaining the polishing solution. According tothe preparation method of the polishing solution, the polishing solution with the pH value of 5.5-6 can be prepared, and by virtue of the preparation processes such as repeated hot filtration after standing, multiple intermittent stirring and the like, the cerium oxide in the polishing solution is uniformly distributed, the chemical corrosion and mechanical actions of the prepared polishing solution on quartz glass reach a peer state, namely the chemical polishing and mechanical polishing actions are balanced, the polishing effect is optimal, and the polishing solution is applicable to the processing requirement of quartz glass subjected to ultra-precision polishing.
Description
technical field [0001] The invention relates to the technical field of polishing, in particular to a polishing liquid and a preparation method thereof. Background technique [0002] Quartz glass has an extremely low coefficient of thermal expansion, high temperature resistance, excellent chemical stability, excellent electrical insulation, low and stable ultrasonic delay performance, the best performance in ultraviolet spectrum and visible light and near infrared spectrum Performance, and has higher mechanical properties than ordinary glass. Therefore, quartz glass is one of the indispensable excellent materials in space technology, atomic energy industry, national defense equipment, automation system, semiconductor, metallurgy, chemical industry, electric light source, communication, light industry, building materials and other industries in modern cutting-edge technology. [0003] Polishing is an important processing method to obtain ultra-smooth quartz glass surface, and...
Claims
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