Patterning methods for nanomaterials

Abstract

The invention discloses a method for patterning nanometer materials. The patterning method includes the following steps: providing a net plate, a filter membrane and a substrate; covering the net plate on the filter membrane; Printing polymer slurry to form a patterned polymer slurry layer on the surface of the filter membrane; depositing nanomaterials on the patterned area of ​​the polymer slurry layer to form a nanomaterial structure; The structure is transferred onto the substrate. In the method for patterning nanomaterials provided by the present invention, an imaged polymer slurry layer is formed by screen printing, and then nanomaterials are deposited on the patterned region of the polymer slurry layer to form a patterned nanomaterial structure; Finally, the nanomaterial structure is transferred onto the substrate. The imaging method can effectively realize the patterning of nanomaterials and improve the patterning quality of nanomaterials.

Description

technical field [0001] The invention relates to the technical field of patterning of nanomaterials, in particular to a patterning method of nanomaterials. Background technique [0002] Due to its special nano-effects, nanomaterials have been increasingly used in various fields of science and engineering in recent years. Common nanomaterials include graphene, silver nanowires, and carbon nanotubes. Graphene is a new type of nanomaterial with the thinnest, strongest, and strongest electrical and thermal conductivity found so far. It is regarded as the most potential substitute for silicon materials. It is used to manufacture ultra-miniature transistors and produce future supercomputers. Silver nanowires are one-dimensional nanomaterials with a high aspect ratio, and are considered to be the most likely material to replace traditional ITO transparent electrodes. It provides the possibility to realize flexible and bendable LED displays, touch screens, etc. A large number of st...

AI Technical Summary

Problems solved by technology

[0003] In the process of research and use of nanomaterials, how to effectively realize its patterning is the key to determine the application of nanomaterials, but for sheet-like two-dimensional materials and one-dimensional nanowire materials with high aspect ratio, the patterning method is relatively difficult

At present, the existing methods mainly include the following: one is the method of inkjet printing (ACS Appl.Mater.Interfaces, 2015, 7(17), pp 9254–9261). For the printing of sheet-like graphene or linear nanowire materials, it is difficult to achieve high-quality patterning due to the limitations of the nozzle (sheet-like two-dimensional materials and linear one-dimensional materials are difficult to print through inkjet nozzles) ; One is through photolithography or laser cutting (ACSAppl.Mater.Interfaces2015, 7, 13467-13475; Nanoscale, 2014, 6, 946–952), photolithography and laser cutting itself are a very mature patterning method , but they are all subtractive processing processes, which have the disadvantages of destroying the structure of nanomaterials and wasting raw materials, and the flatness of the cutting edge is very difficult to control; there is also a method of electrostatic spraying (ACS Appl.Mater.Interfaces 2015 , 7, 14272-14278), electrostatic spraying itself is a method of uniform film formation, but patterning requires the use of masks, and electrostatic spraying itself cannot accurately control the deposition amount of nanomaterials per unit area of ​​the surface, so it is not An effective method for patterning sheet-like 2D materials and 1D materials with high aspect ratio

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