Method for removing flux from surface of substrate and chip on substrate
A flux and substrate technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as increased manufacturing costs, waste of water resources, and inability to use brushes, so as to improve reliability and surface bonding. state, the effect of improving bond adhesion
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[0023] The technical scheme of the present invention is described in further detail below:
[0024] A method for removing flux from substrates and chip surfaces thereon, comprising the following steps:
[0025] Step 1. Use water-based cleaning reagent to clean the flux on the substrate and its chip;
[0026] Step 2, using bromopropane vapor phase cleaning technology to clean the substrate and the chip on it after step 1 cleaning; details are as follows:
[0027] Put the substrate cleaned in step 1 in the cleaning chamber, inject bromopropane gas into the cleaning chamber, heat the bromopropane gas to boiling, the bromopropane gas vapor rises, and when it touches the substrate to be cleaned in a cold state, the vapor Condensate on the surface of the substrate and the chip on it, condense into a liquid state and take away part of the flux while sliding down;
[0028] Step 3: Use a plasma cleaning system to perform argon plasma cleaning on the substrate and the chip on it after...
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