Magnetorheological polishing adhesive and preparation method thereof

Abstract

The invention provides a magnetorheological polishing adhesive and a preparation method thereof. The magnetorheological polishing adhesive is composed of carbonyl iron powder (30%-70%), polishing powder (2%-7%), gel (0.5%-5%), gas-phase silicon dioxide (0.2%-1.5%), deionized water (10%-35%), and glycerol (15%-40%). The preparation method comprises the following steps: (1) weighing the carbonyl iron powder, the polishing powder, the gas-phase silicon dioxide, the gel, the deionized water and the glycerol according to a formula of the magnetorheological polishing adhesive; (2) putting the glycerol and the deionized water into a container, performing stirring to obtain a glycerol aqueous solution, performing heating, dissolving the gel into the glycerol aqueous solution under stirring to forma mixed solution; (3) adding the weighed carbonyl iron powder, the weighed gas-phase silicon dioxide, and the weighed polishing powder to the mixed solution in sequence, and performing stirring to obtain a magnetorheological polishing adhesive; and (4) putting the formed magnetorheological polishing adhesive into a refrigerating chamber, performing refrigeration, and taking the adhesive out whenusing. The magnetorheological polishing adhesive provided by the invention has the simple preparation method, higher stability and a higher shear yield stress, and can meet performance requirements ofprocessing.

Description

technical field [0001] The invention relates to the technical field of ultra-smooth polishing, in particular to a magnetorheological polishing glue and a preparation method thereof. Background technique [0002] With the rapid development of modern science and technology, there are more and more demands for ultra-smooth surfaces in many fields such as microelectronics, optics and aviation industry. An ultra-smooth surface refers to a surface with a surface roughness less than 1 nm. However, the current ultra-smooth surface processing technology is mostly fixed abrasive or free abrasive processing. For example, the widely used chemical mechanical polishing method is a typical free abrasive processing. However, these processing methods are all rigid contact, which is easy to produce scratches on the surface of the workpiece. There are no traces or residual stress, which greatly restricts the subsequent expansion and application of the workpiece. In terms of flexible polishin...

AI Technical Summary

Problems solved by technology

However, the current ultra-smooth surface processing technology is mostly fixed abrasive or free abrasive processing. For example, the widely used chemical mechanical polishing method is a typical free abrasive processing. However, these processing methods are all rigid contact, which is easy to produce scratches on the surface of the workpiece. marks or residual stress, which greatly restricts the subsequent expansion and application of the workpiece

In terms of flexible polishing, magnetorheological polishing has been studied more, but the shear yield stress that magnetorheological fluid can achieve under the action of a magnetic field is limited, and the material removal rate is relatively low.

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