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Method for preparing ultra-clean graphene by utilizing copper acetate

A graphene, ultra-clean technology, applied in the field of materials, can solve the problems that affect the mechanical properties and thermal conductivity of graphene, affect the electrical transport properties and light transmittance of graphene, and achieve simple and effective preparation methods, clean surfaces, Excellent effect

Active Publication Date: 2017-12-22
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, during the growth process of graphene, pollutants of amorphous carbon often remain, and these pollutants will not only affect the electrical transport properties and light transmittance of graphene, but also affect the mechanical properties and thermal conductivity of graphene.

Method used

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  • Method for preparing ultra-clean graphene by utilizing copper acetate
  • Method for preparing ultra-clean graphene by utilizing copper acetate
  • Method for preparing ultra-clean graphene by utilizing copper acetate

Examples

Experimental program
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Embodiment 1

[0041] Embodiment 1, preparation ultra-clean graphene

[0042] (1) Using phosphoric acid and ethylene glycol solution with a mass ratio of 3:1 as the electrolyte, copper foil (produced by Alfa Aesar, with a purity of 99.8%, and a thickness of 25 μm) was connected to the positive electrode, and polished at a DC current of 0.8 A for 15 minutes. Place the copper foil in a casing with a magnetic control device, then place the casing in a tube furnace, place copper acetate solid powder in a quartz boat and place it upstream of the copper foil, under a hydrogen atmosphere with a flow rate of 100 sccm , raise the temperature of the furnace body to 1020°C and keep it for 60 minutes;

[0043] (2) Keep the temperature of the furnace body at 1020°C, feed hydrogen gas with a flow rate of 100sccm, heat the copper acetate powder to 220°C to volatilize it, the heating rate is 40°C / min, keep it for 5 minutes, that is, carry out chemical vapor deposition for 5 minutes ;

[0044] (3) Use a ma...

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Abstract

The invention discloses a method for preparing ultra-clean graphene by utilizing copper acetate. The method comprises the following steps: sequentially putting the copper acetate and copper substrates at intervals in directions of an air path from upstream to downstream; introducing hydrogen for chemical gas phase deposition; obtaining the ultra-clean graphene after deposition is completed, wherein temperature of a temperature zone in which the copper acetate is located is volatilization temperature of the copper acetate. The preparation method is simple, raw materials are easy to get, the cleanliness of the graphene is superior to a result obtained by growth of methane, so that a single layer of graphene film with ultra-cleanliness and high quality can be obtained; moreover, the graphene film has great application prospects in the fields of optics, electricity and the like.

Description

technical field [0001] The invention belongs to the field of materials, and in particular relates to a method for preparing ultra-clean graphene by using copper acetate. Background technique [0002] Graphene is a carbon atom with sp 2 Single-atom layer two-dimensional materials formed by hybridization. Studies have shown that graphene has excellent properties that other materials cannot match, such as high mobility, high light transmission and high mechanical strength, which has greatly stimulated the interest of chemistry, physics and materials scientists. Nowadays, from the research on the intrinsic properties of graphene to the exploration of the potential application of graphene, the research on graphene is in full swing. [0003] The development of graphene is inseparable from a stable preparation process. The common preparation methods of graphene include mechanical exfoliation, redox method, epitaxial growth method and chemical vapor deposition method. The graphe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/186
CPCC01B2204/22C01B2204/24C01B2204/30C01P2004/01C01P2004/04
Inventor 刘忠范彭海琳贾开诚张金灿林立孙禄钊
Owner PEKING UNIV
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