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Etching solution composition for molybdenum-containing metal film and manufacturing method for array substrate for display using the same

A technology of composition and etching solution, which is applied in the direction of surface etching composition, chemical instrument and method, semiconductor/solid-state device manufacturing, etc., can solve the problems of increased process cost, short service life, large difference in etching performance, etc., and achieve change The effect of small amount and excellent service life

Active Publication Date: 2017-10-24
DONGWOO FINE CHEM CO LTD
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Problems solved by technology

[0005] When the molybdenum alloy film and the metal oxide film are etched with the same etchant, the manufacturing process can be simplified, but generally there is a problem that the molybdenum alloy film is difficult to perform wet etching due to its excellent chemical resistance.
In addition, the etching performance varies greatly depending on the number of sheets processed, so there are problems of short service life, increased process costs, and increased costs.

Method used

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  • Etching solution composition for molybdenum-containing metal film and manufacturing method for array substrate for display using the same

Examples

Experimental program
Comparison scheme
Effect test

experiment example 1

[0073] Experimental example 1. Measurement of side etch variation with the number of sheets processed

[0074] In the experimental equipment (model name: ETCHER (TFT), SEMES company) of jet etching mode, respectively pack the etching liquid composition of above-mentioned embodiment 1~10 and comparative example 1~3, set the temperature of etching liquid composition It is about 35°C and heated. The total etching time can vary depending on the etching temperature, and the molybdenum-based metal film and the metal oxide film are usually performed in about 80 to 100 seconds in the LCD etching process.

[0075] When measuring the amount of side erosion change with the number of sheets processed, the Mo-Ti and ITO powder contained in the film quality can be used to reflect the change of the metal concentration (ppm) in the composition of the etching solution with the etching of the substrate. The method of putting in the composition is carried out. In the case of 1,000ppm, 500ppm ...

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Abstract

The invention provides an etching solution composition for molybdenum-containing metal film and a manufacturing method for array substrate for display using the same, and the etching solution composition for molybdenum-containing metal film contains hydrogen peroxide, fluorine compound, azole compound, hydroxylamine derivative and water in a certain content.

Description

technical field [0001] The invention relates to an etchant composition containing a molybdenum (Mo) metal film and a method for manufacturing an array substrate for a display device using the same. Background technique [0002] With the advent of the information age, the field of displays, which process and display large amounts of information, has developed rapidly. Thanks to this, various flat panel displays have been developed and attracted attention. [0003] Examples of such flat panel display devices include liquid crystal display devices (Liquid Crystal Display device: LCD), plasma display devices (Plasma Display Panel device: PDP), field emission display devices (Field Emission Display device: FED), organic Light emitting elements (Organic Light Emitting Diodes: OLED) and the like. As an example, a liquid crystal display device is attracting attention because it provides a clear image with excellent resolution, consumes less power, and can manufacture a thinner disp...

Claims

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Application Information

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IPC IPC(8): C23F1/14H01L21/77
CPCH01L27/1259C23F1/14C23F1/26C23F1/38C09K13/00G02F1/1343
Inventor 金镇成金炼卓梁圭亨
Owner DONGWOO FINE CHEM CO LTD
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