Manufacturing method and manufacturing equipment for thin film, display substrate and manufacturing method therefor
A production method and technology for display substrates, which are applied in semiconductor/solid-state device manufacturing, instruments, semiconductor devices, etc., can solve the problems of decreased material utilization efficiency, difficulty in ensuring thin film flatness, and uneven lighting brightness of devices, so as to improve the uniformity of light emission. The effect of consistency, thickness and improving utilization rate
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[0037] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the following will clearly and completely describe the technical solutions of the embodiments of the present invention in conjunction with the drawings of the embodiments of the present invention. Apparently, the described embodiments are some, not all, embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the described embodiments of the present invention belong to the protection scope of the present invention.
[0038] Please refer to image 3 , image 3 It is a schematic flow chart of a method for manufacturing a thin film according to an embodiment of the present invention, the method comprising:
[0039] Step S11: providing a substrate on which a pixel defining layer (PDL) is formed;
[0040] Step S12: coating ink in the pixel area defined by the pixel defining layer;
[0041] Specifically, ...
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