A thin film manufacturing method, manufacturing equipment, display substrate and manufacturing method thereof
A manufacturing method and a display substrate technology, which are applied in semiconductor/solid-state device manufacturing, instruments, semiconductor devices, etc., can solve problems such as difficulty in ensuring flatness of films, uneven lighting brightness of devices, and decreased material utilization efficiency, so as to improve luminescence Uniformity, uniform thickness, effect of reducing climbing phenomenon
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[0037] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the following will clearly and completely describe the technical solutions of the embodiments of the present invention in conjunction with the drawings of the embodiments of the present invention. Apparently, the described embodiments are some, not all, embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the described embodiments of the present invention belong to the protection scope of the present invention.
[0038] Please refer to image 3 , image 3 It is a schematic flow chart of a method for manufacturing a thin film according to an embodiment of the present invention, the method comprising:
[0039] Step S11: providing a substrate on which a pixel defining layer (PDL) is formed;
[0040] Step S12: coating ink in the pixel area defined by the pixel defining layer;
[0041] Specifically, ...
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