Optical processing systems and methods

Abstract

The invention discloses an optical processing system and an optical processing method. The system comprises a lighting source, a spatial light modulator, a micro-lens array and an imaging lens (group) sequentially arranged along the light path direction, wherein the spatial light modulator is positioned on the front focal plane of the micro-lens array; the front focal plane of the imaging lens (group) is overlapped with the rear focal plane of the micro-lens array; the spatial light modulator is of an amplitude type and has multiple blocks in two-dimensional distribution; the micro-lens array comprises multiple micro-lenses distributed in the same plane; each micro-lens is corresponding to a block in the primary optical axis direction. The system and method disclosed by the invention at least have the advantages of no mechanical movement mechanism, fast and reliable response, better equipment performance, clear graph outline and acquisition of multiple interference figures.

Description

technical field [0001] The present application belongs to the field of laser processing, and in particular relates to an optical processing system and method. Background technique [0002] Photolithography is the main method for the preparation of micro-nano structures. The current lithography technology is mainly divided into two categories: imaging lithography and interference lithography. Imaging lithography is suitable for the production of arbitrary graphic structures, while interference lithography is more suitable for the production of specific periodic structures. These periodic structures are usually formed by the interference and superposition of two or more beams on the exposure surface. The typical pattern There are parallel stripes (that is, gratings), orthogonal dot matrix and hexagonal patterns, etc. Based on the directional deflection characteristics of periodic structures to light fields, interference lithography is widely used in digital holography and thr...

AI Technical Summary

Problems solved by technology

[0006] 1. System performance is limited by SLM materials

Under the current technical conditions, various phase modulation devices including LCoS can only use liquid crystal materials, the refresh frequency is low (about 100Hz) and cannot withstand large optical power, which is not conducive to the realization of efficient photolithography processing

In addition, the liquid crystal material has low transmittance to ultraviolet light and will be damaged, so its lithography system cannot use short-wavelength light sources, which is not conducive to obtaining high-resolution lithography patterns

[0007] 2. It is difficult to obtain a clear fringe outline

It can be seen from the reference that the outline of its lithographic pattern is still not clear enough, especially when the stripe period is large

[0008] The master's thesis "Continuously Variable Space-Frequency Interferometric Lithography Technology for Diffractive Spatial Imaging" proposed another interference lithography system and method based on spatial light modulator. The focal plane, the exposure plane is located on the rear focal plane of the lens, which does not satisfy the imaging relationship, so in principle it is impossible to achieve a clear graphic outline output

Patent CN201210440974.2 "A System and Method for Interferometric Lithography Based on Spatial Light Modulator" also has the same problem. In addition, the spectrum plane needs to be filtered, which further affects the graphic profile

[0009] Based on the above analysis, the existing interference lithography technology cannot achieve high-quality and high-efficiency interference pattern processing

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