ITO film plating rework treatment etching solution and preparation method thereof

A technology of etching solution and hydrochloric acid, which is applied in the field of ITO coating rework treatment etching solution and its preparation, can solve the problems of microcrystal residue, insufficient wettability of ITO layer, blockage of client filter, etc., and achieve reduction of scrap rate and wettability Good effect with less residual microcrystals

Inactive Publication Date: 2017-02-08
赣州帝晶光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] At present, the ITO etching solution is mainly composed of oxalic acid crystals and pure water. This product mainly has the following disadvantages: ①The surface tension of the oxalic acid-type ITO etching solution used by domestic manufacturers is about 70mN / m, and the wettability of the ITO layer is insufficient. , resulting in the presence of microcrystal residues after etching; ②At the same time, when customers use it, it is easy to cause the customer's filter to be blocked, which will affect the customer's equipment and use

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] An ITO coating rework treatment etching solution, which is uniformly mixed with five raw materials including hydrochloric acid, oxalic acid, organic polyphosphoric acid, iodic acid and pure water; the weight percentages of each raw material are: hydrochloric acid 12%, oxalic acid 8%, organic poly Phosphonic acid 3%, iodic acid 1%, and the rest is pure water. Among them, the concentration of hydrochloric acid is 55%, oxalic acid is oxalic acid crystal with a concentration of 99.6%, the concentration of organic polyphosphonic acid is 87%, and the concentration of iodic acid is 89%.

[0023] A kind of preparation method of above-mentioned ITO coating rework treatment etchant, its steps are as follows:

[0024] Step 1: Add the strong acidic cation exchange resin into the hydrochloric acid, stir and mix, the stirring speed is 70 rpm, and the stirring time is 10 minutes, then filter out the strong acidic cation exchange resin to control or remove impurity ions in the hydrochl...

Embodiment 2

[0031] An etching solution for ITO coating rework treatment is formed by uniformly mixing five raw materials including hydrochloric acid, oxalic acid, organic polyphosphoric acid, iodic acid and pure water; wherein, the weight percentages of each raw material are: hydrochloric acid 10%, oxalic acid 12%, 4% organic polyphosphonic acid, 2% iodic acid, and the rest are pure water; wherein, the concentration of hydrochloric acid is 60%, oxalic acid is oxalic acid crystal with a concentration of 99.7%, the concentration of organic polyphosphonic acid is 88%, and the concentration of iodic acid is 90%.

[0032] A kind of preparation method of above-mentioned ITO coating rework treatment etchant, its steps are as follows:

[0033] Step 1: Add the strong acidic cation exchange resin into the hydrochloric acid, stir and mix, the stirring speed is 70 rpm, and the stirring time is 10 minutes, then filter out the strong acidic cation exchange resin to control or remove impurity ions in th...

Embodiment 3

[0040] An ITO coating rework treatment etching solution, which is formed by uniformly mixing five raw materials including hydrochloric acid, oxalic acid, organic polyphosphoric acid, iodic acid and pure water; wherein, the weight percentage of each raw material is: hydrochloric acid 15%, oxalic acid 10%, 4% organic polyphosphonic acid, 1.8% iodic acid, and the rest are pure water; wherein, the concentration of hydrochloric acid is 65%, oxalic acid is oxalic acid crystal with a concentration of 99.7%, the concentration of organic polyphosphonic acid is 90%, and the concentration of iodic acid is 92%.

[0041] A kind of preparation method of above-mentioned ITO coating rework treatment etchant, its steps are as follows:

[0042] Step 1: Add the strong acidic cation exchange resin into the hydrochloric acid, stir and mix, the stirring speed is 70 rpm, and the stirring time is 10 minutes, then filter out the strong acidic cation exchange resin to control or remove impurity ions in...

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PUM

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Abstract

Belonging to the field of TFT-LCD thinning film plating, the invention discloses an ITO (indium tin oxide) film plating rework treatment etching solution and a preparation method thereof. The ITO film plating rework treatment etching solution is formed by mixing the five raw materials hydrochloric acid, oxalic acid, organic polybasic phosphoric acid, iodic acid and pure water evenly. The preparation process of the ITO film plating rework treatment etching solution consists of: adding strong acid cation exchange resin into hydrochloric acid, conducting mixing, then filtering out the strong acid cation exchange resin, and controlling or removing impurity ions in hydrochloric acid; and successively adding oxalic acid crystals, part of pure water, hydrochloric acid, organic polybasic phosphoric acid, iodic acid and residual pure water, and finally performing filtering to obtain the ITO film plating rework treatment etching solution. The etching solution provided by the invention has good wettability to an ITO layer, and guarantees complete etching of ITO on TFT-LCD, thus reducing scrap rate of the product. After etching, the microcrystal residue is few, thereby ensuring that the etching solution does not block a filter during use.

Description

technical field [0001] The invention belongs to the field of TFT-LCD thinning coating, and in particular relates to an etching solution for ITO coating rework treatment and a preparation method thereof. Background technique [0002] Indium Tin Oxides (Indium Tin Oxides) conductive film refers to the product obtained by sputtering transparent ITO conductive film coating on the CF surface of TFT-LCD by magnetron sputtering. [0003] In the production process, the products will inevitably have some bad ITO coatings. In order to reduce the cost of the enterprise, it is necessary to rework the products with poor ITO coatings, remove the coatings, and re-coat the films to reduce product waste and reduce the cost of the company's products. Scrap rate. A common method for reworking the ITO coating is to use etching. [0004] Etching is the technique of removing material using chemical reaction or physical impact. Etching techniques are divided into wet etching and dry etching. A...

Claims

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Application Information

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IPC IPC(8): C09K13/06
CPCC09K13/06
Inventor 陈新华严由雄刘生华
Owner 赣州帝晶光电科技有限公司
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