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MCP (microwave coupled plasma) resonant cavity

A technology for coupling plasma and resonant cavity, applied in plasma, ion source/gun, particle separation tube, etc. Abnormal shape and other problems, to achieve the effect of high utilization rate of microwave energy, perfect unity of power density and volume, and energy concentration

Active Publication Date: 2017-01-04
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the method of simply increasing the incident power has been proved to be limited in practice, because the cavity size of the torch is relatively small, so the power capacity of the cavity is limited
Even if a high-power microwave source is used to input excessive microwave power, the increase in plasma electron density is limited, and the excess microwave energy can neither be reasonably received by the cavity nor completely consumed by gas ionization
Among the microwave energy that cannot be absorbed and utilized, part of it returns to the absorbing load in the microwave power source as reflected power, which is wasted as useless power; the other part leaks into the surrounding space, and part of the microwave power is lost inside the cavity, which increases the heating of the cavity
[0004] On the other hand, simply enlarging the cavity size of the original torch in proportion, this technical route has also been proved repeatedly by practice to be unfeasible
Simply increasing the size of the torch without increasing the power density at the same time will lead to abnormal shape of the plasma, or unstable state of the plasma, which will not improve the sample tolerance and excitation ability of the plasma at all.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Such as figure 2 As shown, it is a microwave resonant cavity capable of generating triple compound laminar microwave-coupled plasma (MCP). The structure includes an outer conductor 1, a microwave antenna 2, an inner conductor 3, a middle tube 4, an inner tube 5, a sample tube 6, Sample inlet 7, auxiliary gas inlet 8, working gas inlet 9, maintenance gas inlet 10, shielding gas partition 11, shielding gas inlet 12, cooling ring 13, shielding gas choke cone 14 and impedance matching cone 15.

[0037] The resonant cavity provided in this embodiment is sequentially designed with hollow outer conductor 1 , inner conductor 3 , middle tube 4 , inner tube 5 , and sample tube 6 with coincident axes from outside to inside. Wherein, the inner conductor 3 is designed inside the outer conductor 1 , the middle tube 4 is designed inside the inner conductor 3 , the inner tube 5 is designed inside the middle tube 4 , and the sample tube 6 is designed inside the inner tube 5 . The samp...

Embodiment 2

[0069] Such as image 3 As shown, it is a microwave resonant cavity capable of generating double compound laminar microwave coupled plasma (MCP), and its structure includes an outer conductor 1, a microwave antenna 2, an inner conductor 3, a middle tube 4, a sample tube 6, a sample inlet 7, Working gas inlet 9 , maintenance gas inlet 10 , shielding gas partition 11 , shielding gas inlet 12 , cooling ring 13 , shielding gas choke cone 14 and impedance matching cone 15 .

[0070] Compared with Embodiment 1, this embodiment differs in that the inner tube 5 and the auxiliary gas inlet 8 are missing, the inner diameter of the outer conductor 1 is 26-56 mm, the outer diameter of the inner conductor 3 is preferably 8-16 mm, and the inner diameter is preferably 6-14 mm. The microwave source used in the microwave resonant cavity of this embodiment is the same as that of Embodiment 1, and the working process is the same as that of Embodiment 1, except that one path of auxiliary gas is u...

Embodiment 3

[0073] Such as Figure 4 As shown, it is a microwave resonant cavity capable of generating laminar microwave coupled plasma (MCP). The structure includes an outer conductor 1, a microwave antenna 2, an inner conductor 3, a sample tube 6, a sample inlet 7, a maintenance gas inlet 10, a shield Air separator 11 , shielding gas inlet 12 , cooling ring 13 , shielding gas choke cone 14 and impedance matching cone 15 .

[0074] Compared with Embodiment 1, this embodiment differs in that the inner pipe 5, the middle pipe 4, the auxiliary gas inlet 8 and the working gas inlet 9 are missing, the inner diameter of the outer conductor 1 is 22-50 mm, and the outer diameter of the inner conductor 3 is preferably 7 mm. ~12mm, the inner diameter is preferably 5~10mm. The microwave source used in the microwave resonator of this embodiment is the same as that of Embodiment 1, and the working process is the same as that of Embodiment 1, but no auxiliary gas and working gas are used.

[0075] W...

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Abstract

The invention discloses an MCP (microwave coupled plasma) resonant cavity, and belongs to the technical field of microwave application. The structure of the MCP resonant cavity comprises an outer conductor (1), a microwave antenna (2), an inner conductor (3), a sample inlet (7), a gas maintaining inlet (10), a gas shielding partition plate (11), a gas shielding inlet (12), a cooling ring (13), a gas shielding choke cone (14) and an impedance matching cone (15). The design of the MCP resonant cavity increases the power density of a plasma, and further increases the volume of a plasma torch, so that the bearing capability and the excitation capacity of a torch sample are stronger, a gaseous sample or an atomized water solvent sample and an organic solvent sample can be directly introduced to be measured. The MCP resonant cavity disclosed by the invention further has the characteristics of high stability, wide application range and the like.

Description

technical field [0001] The invention belongs to the field of microwave application technology, and in particular relates to a microwave coupling plasma resonant cavity which can be used in the field of analytical instruments. Background technique [0002] Microwave plasma resonant cavity plays an important role in the field of analytical instruments. It is an important part of spectrometers and mass spectrometers. It can be used as an excitation source for atomic emission spectrometers and as an ion source for mass spectrometers. The closest prior art with the present invention is the Chinese patent "Microwave Plasma Torch" (abbreviated as MPT) whose publication number is CN94205428.8. figure 1 As shown, it consists of an outer conductor, an inner conductor and a sample tube. The sample tube passes through the dry sample aerosol, and enters the central channel of the plasma for excitation and ionization. A sustaining gas is passed between the sample tube and the inner cond...

Claims

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Application Information

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IPC IPC(8): H05H1/46H01J49/10
CPCH01J49/105H05H1/46H05H1/461
Inventor 曹彦波于爱民
Owner JILIN UNIV
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