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Method for manufacturing force responsive photonic crystal materials based on inverse compressing nano-forming technology

A nano-molding technology and photonic crystal technology, which is applied in the field of preparation of force-responsive photonic crystal materials, can solve the problems of difficulty in preparing nano-scale photonic crystals, limited precision of photonic crystals, poor structure controllability, etc., and achieve shortening The effect of preparation cycle, short preparation cycle, and reduction of preparation cost

Active Publication Date: 2016-12-14
SHANDONG UNIV OF SCI & TECH
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Problems solved by technology

Therefore, it is difficult to prepare nanoscale photonic crystals by laser holographic interferometry
[0008] In a nutshell, the existing preparation methods of force-responsive photonic crystal materials generally have the following shortcomings or deficiencies: complex process, long preparation cycle, and high cost; poor controllability

Method used

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  • Method for manufacturing force responsive photonic crystal materials based on inverse compressing nano-forming technology
  • Method for manufacturing force responsive photonic crystal materials based on inverse compressing nano-forming technology
  • Method for manufacturing force responsive photonic crystal materials based on inverse compressing nano-forming technology

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Embodiment 1

[0050] The preparation method of the force-responsive photonic crystal is as follows:

[0051] 1. If figure 1 As shown, the preparation steps of the quartz mother template are as follows:

[0052] (1) According to actual needs, pre-design the structural parameters of photonic crystals, mainly including: the surface structure is a hexagonal columnar lattice, the lattice period is 200nm, the diameter of the raised columns is 100nm, and the height of the raised columns is 150nm. The effective area is 20×20mm 2 .

[0053] (2) Take a piece of quartz substrate (size is 25mm×25mm), according to the structural parameters of the above photonic crystal, use electron beam lithography technology to expose the quartz substrate and the photoresist on it for 30s, and obtain a strip after development. A photoresist with a design pattern; then, use reactive ion etching technology to etch the quartz substrate and the photoresist on it for 20 minutes, in order to accurately transfer the patte...

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Abstract

The invention discloses a method for manufacturing force responsive photonic crystal materials based on inverse compressing nano-forming technology. Electron beam lithography technology and reactive ion etch technology are employed. A nanometer magnitude pattern is etched on a rigid template to serve as a mother template according to preset photonic crystal structure parameters. An elastic polymer soft template with an inverse nanometer magnitude pattern can be made and serves as a secondary template. With highly elastic gel as filling material and visco-elastic polymer as moulding material, the pattern on the mother template is copied on to the visco-elastic polymer in a high fidelity way through inverse compressing, so as to produce nanometer magnitude and structure-controllable force responsive photonic crystal. Compared with the prior art, the method has the advantages of simple process, short flow, easily controlled technological parameters, repeatedly usable templates, high product precision level, stable and reliable product quality and low cost.

Description

technical field [0001] The invention relates to a method for preparing a force-responsive photonic crystal, in particular to a method for preparing a force-responsive photonic crystal material based on reverse embossing nano-molding technology. Background technique [0002] The preparation of the force-responsive photonic crystal material is completed by filling the highly elastic gel material with excellent mechanical properties in the nanoscale photonic crystal lattice gap. Through mechanical stretching or compression, the highly elastic polymeric network structure will increase or decrease the lattice spacing of photonic crystals, resulting in changes in diffraction wavelength and structural color, and realize the transformation of physical deformation into optical performance changes. Sensing function. [0003] Studies have shown that the multilayer structure composed of highly elastic gel and viscoelastic polymer with nanoscale photonic crystal structure has good mecha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 王清张睿郑旭马立俊张艳菊张星远杜文全
Owner SHANDONG UNIV OF SCI & TECH
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