Cyanide-free electroplating copper solution and its preparation method and application method
A technology for electroplating copper and solution, applied in the field of material science, can solve the problems of poor adhesion between the coating and the substrate, narrow current density range, low current efficiency, etc., achieve potential application prospects and economic benefits, and improve current density range and cost. low cost effect
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Embodiment 1
[0018] Embodiment 1 of the present invention: cyanide-free copper plating solution, wherein, the concentration of copper sulfate is 45g / L, and the concentration of succinimide is 100g / L, and the concentration of potassium nitrate is 25g / L, and the concentration of citric acid is 20g / L, the concentration of triethanolamine is 30g / L, the concentration of potassium hydroxide is 40g / L, and the solvent is water.
Embodiment 2
[0019] Embodiment 2 of the present invention: the preparation method of cyanide-free electroplating copper solution, comprises the steps: select each component and solvent consumption by above-mentioned concentration;
[0020] 1) Potassium nitrate is dissolved in succinimide solution to obtain solution A
[0021] 2) adding citric acid and triethanolamine to solution A respectively to obtain solution B;
[0022] 3) adding potassium hydroxide solution to adjust the pH of solution B to 9-10 to obtain solution C;
[0023] 4) Dissolve copper sulfate in distilled water, then slowly add acid copper solution in solution C,
[0024] And keep stirring to obtain solution D;
[0025] 5) Add potassium hydroxide solution, adjust the pH of solution D to 9-10, and constant volume to obtain the finished product.
Embodiment 3
[0026] Embodiment 3 of the present invention: the using method of cyanide-free copper plating solution, the cyanide-free copper plating solution is used for the cyanide-free copper plating of carbon steel surface, and its processing steps are as follows:
[0027] Mechanical polishing → deionized water washing → degreasing → deionized water washing → activation → deionized water washing → electroplating copper → deionized water washing → passivation (anti-discoloration treatment) → deionized water washing → drying
[0028] In the electroplating process, the electroplating temperature is 30-40°C, and the current density is 0.2-8A / dm 2 , time 20 ~ 40min, and the molar ratio of copper ions and succinimide is 1:6.
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